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LIDT: >1 J/cm² @ 1 ns, 266 nm, >5 J/cm² @ 1 ns, 532 nm
Thickness, mm: 1 (±0.1)

S2: AR<0.5% @ 266 nm, AOI = 0-5°
S1: HR>99.5% @ 532 nm + HT>90% @ 266 nm, AOI = 0-5°
S1/S2 Surface quality, S-D: 20-10
S1/S2 Surface flatness: λ/2@ 633 nm
Material: CaF2 (DUV grade)
Diameter, mm: 6 (+0/-0.1)
Coatings:
Clear Aperture: >85
Chips: <0.1 mm
Protective chamfers: 0.1-0.2 mm x 45°
Parallelism error: <1 arcmin

Parallelism error: <20 arcsec
Width: 10.0+0/-0.1mm

Wedge / Parallelism error: S2 has wedge zone 1mm@30deg as per drawing
Transmitted wavefront distortion, PV: Surface quality S1/S2: 20-10 S-D
Shape as per drawing:
Center thickness, mm: 2.0+/-0.1mm
S1: (HRs>99,8%, HTp>99%)@1061-1067nm, AOI=44,5-45,5° +R<33@633nm,AOI=45°
Material: UVFS (Corning 7980 0F)
LIDT: >1GW/cm2 @1064, 15ns
Length: 12.0+0/-0.1mm
Corners cut: 4*1mm@45deg
Protective chamfers: 0.5mm all around.
S2: HR(Rs>95%)@780-830nm, AOI=30-60°+ AR(Rp<0,5%)@ 1061-1067nm, AOI=44,5-45,5°+ R(<33%)@633nm, AOI=44,5-45,5°

Protective chamfers: <0.25 mm x 45°
Surface quality, S1/S2: 20/10 S/D

Transmitted wavefront distortion, PV: λ/10 @ 633 nm
S2: AR(Ravg<0.2%)@515 nm, AOI=45°
S1: HR(Ravg>97%)@248nm, HT(Tavg>90%)@515 nm, AOI=45°
Material: UVFS (JGS1)
Edge thickness, mm: 2.0 mm (+/-0.1 mm)
Diameter, mm: 12.7 mm (+0.0/-0.1 mm)
Clear aperture: >90%
Coatings: E-Beam
Your part: # 00000802
Paralleslism error: <30 arcsec

Protective chamfers: <0.25 mm x 45°
Wedge / Parallelism error: <1 arcmin

Transmission (s+p)/2 and wavelength, nm: T>95% @ 800
Surface quality, S-D: 20-10
Reflectivity (s+p)/2, %: R>99.5% @ 400
S1 Flatness, PV IR S2 Flatness, PV: <λ/8 @ 632.8 nm
Dimensions, mm: Ø25.4 (+0/-0.1) x 5 (±0.1)
Clear Aperture: >90
Angle of Incidence (AOI), °: 45
Material: UVFS

Surface quality S1/S2, S-D: 40-20
Thickness, mm: 5 (+/-0.1)

S1 Flatness, PV IR S2 Flatness, PV: λ/4 @ 632.8 nm
S2: AR<0.5%@ 532+1064nm, AOI=45°
S1: HRs>99%@ 266+355+HTp>97%@ 532+1064 nm, AOI=45°
Protective chamfers: <0.3 mm x 45°
Material: UVFS (Corning 7980 0F)
LIDT: 15 J/cm2 @ 1064nm, 10ns, 10 Hz
Dimensions, mm: Ø12.7 (+0/-0.1)
Coatings:
Clear aperture: >90 %
Parallelism error: < 1 arcmin

Protective chamfers: <0.25 mm x 45°
Thickness, mm: 3 (±0.1)

Surface quality: 20-10 S-D
S1 Flatness, PV IR S2 Flatness, PV: <λ/4 @ 632.8 nm
S1: HS1: HR(R>99.5%) @660nm + HT(Tavg>90%) @400-550nm + HT(Tavg>90%) @800-1600nm, AOI=45°
Material: UVFS
LIDT: >15 J/cm2 @1064 nm for 10 ns pulses
Dimensions, mm: 35 x 25 (+0.0/-0.1)
Coating adhesion and durability: Per MIL-C-675A
Clear aperture: >90%
S2: HT(T>95%) @940nm + HT(T>95%) @400-1600nm, AOI=45°

Dimensions, mm: Ø25.4 (+0/-0.1) x 5 (±0.1)
Rs-Rp, %: 5%

Wedge / Parallelism error: <1 arcmin
Wavelength, nm: 1025-1095
Transmitted wavefront distortion, PV: <λ/8 @ 632.8 nm
Surface quality, S-D: 20-10
Protective chamfers: <0.25 mm x 45°
Angle of Incidence (AOI), °: 45
GDD, fs²: <150
Reflectivity, Rsp %: 50 ±5
Clear Aperture: >90
Material: UVFS

S1 Flatness, PV IR S2 Flatness, PV: <λ/8 @ 632.8 nm
Wedge / Parallelism error: <1 arcmin

Wavelength, nm: 1064
Surface quality, S-D: 20-10
Reflectivity, %: 95 (±1%)
Material: UVFS
Dimensions, mm: Ø25.4 (+0/-0.1) x 5 (±0.1)
Clear Aperture: >90
Angle of Incidence (AOI), °: 0-5
Protective chamfers: <0.25 mm x 45°

Dimensions, mm: Ø25.4 (+0/-0.5)
Circumference finish: fine grounding

Thickness, mm: 3 (±0.2)
Surface quality, S-D: 20-10
S1 Flatness, PV IR S2 Flatness, PV: <λ/4 @ 632.8 nm
Wedge / Parallelism error: <5 arcmin
Material: BK7
Coatings on S2: AR(Rs<0.3%)@532nm
Clear Aperture: >90
Angle of Incidence (AOI), °: 45
Adhesion and durability: Per MIL-C-675A
Damage threshold: > 6J/cm2 @ 10 ns 10Hz 532 nm
Coatings on S1: PR(Rs=50%±2%)@532nm

Protective chamfers: <0.25 mm x 45°
Wedge / Parallelism error: <1 arcmin

Thickness, mm: 6 (±0.1)
Surface quality, S-D: 20-10
S1 Flatness, PV IR S2 Flatness, PV: <λ/8 @ 632.8 nm
S1: HR (R>99%) @ 1064 nm + HT (T>90%) @ 830
Material: UVFS
Dimensions, mm: Ø12.7 (+0/-0.1)
Coatings:
Clear Aperture: >90
Angle of Incidence (AOI), °: 0
S2: AR (R<1%) @ 830 nm

Protective chamfers: <0.25 mm x 45°
Transmission (s+p)/2 and wavelength, nm: T>95% @ 532

Wedge / Parallelism error: <1 arcmin
Reflectivity (s+p)/2, %: R>99.5% @ 1064
S1 Flatness, PV IR S2 Flatness, PV: <λ/8 @ 632.8 nm
Dimensions, mm: Ø25.4 (+0/-0.1) x 6 (±0.01)
Clear Aperture: >90
Angle of Incidence (AOI), °: 45
Surface quality, S-D: 20-10
Material: BK7

Protective chamfers: <0.25 mm x 45°
Wavelength, nm: 1064

Wedge / Parallelism error: <1 arcmin
Surface quality, S-D: 20-10
Reflectivity, %: 90 (±1%)
S1 Flatness, PV IR S2 Flatness, PV: <λ/8 @ 632.8 nm
Dimensions, mm: Ø25.4 (+0/-0.1) x 5 (±0.1)
Angle of Incidence (AOI), °: 0-5
Material: UVFS
Clear Aperture: >90

Protective chamfers: <0.3 mm x 45°
Clear Aperture: >90

Thickness, mm: 6 (±0.1 mm)
Surface quality S1/S2, S-D: 10-5
S2: AR(R<0.25%) @ 976nm, AOI=45°
S1: HRs(R>99%) @ 1020-1040 nm + HT(T>97%) @ 976 nm, AOI=45°
Material: UVFS (Corning 7980 0F)
S1 Flatness, PV IR S2 Flatness, PV: <λ/8 @ 632.8 nm
Coatings:
Wedge / Parallelism error: <1 arcmin
Dimensions, mm: Ø25.4 (+0.0/-0.1 mm)

Protective chamfers: 0.35 mm x 45°
Parallelism error: <1 arcmin

Transmitted wavefront distortion, PV: <λ/10 @ 632.8 nm
Thickness, mm: 2 (±0.25)
S2 Surface quality, S-D: 20-10
S2 Flatness, PV: <λ/4 @ 632.8 nm
S1 Surface quality, S-D: 20-10
Angle of Incidence (AOI) °: 5
Material: BK7
Dimensions, mm: D12.5 (+0.0/-0.1)
Coatings on S2: AR(R<0.5%) @ 808 nm
Coatings on S1: HR(R>99%) @ 1064 nm + HR(R>99%) @ 532 nm + HT(T>90%) @ 808 nm
Clear aperture %: >85
S1 Flatness, PV: <λ/4 @ 632.8 nm

Protective chamfers: <0.3 mm x 45°
Thickness, mm: 6 (±0.1)

Surface quality S1/S2, S-D: 20-10
S2: ARp<0.2% @ 1030 nm, AOI = 45°
S1(^): HRs>99.8% @ 515 nm + HTp>95% @ 1030 nm, AOI = 45°
Parallelism error: <30 arcsec
Material: UVFS (C7980)
S1 Flatness, PV IR S2 Flatness, PV: <λ/8 @ 632.8 nm
Dimensions, mm: Ø12.7 (+0/-0.1)
Clear Aperture: >90
Coatings:

S1 Flatness, PV IR S2 Flatness, PV: 3/1(0.2)
Dimensions, mm: Ø7 (+0/-0.1)

Thickness, mm: 1.5 (±0.1)
Surface quality, S-D: 20-10
Chamfer: <0.3mm
Material: N-BK7
S1: PR(R =50±4%) @ 620 -670 nm, (s+p)/2, AOI = 45°
S2: AR(R< 0.5%) @ 620 -670 nm, (s+p)/2, AOI = 45°

Material: BK7
Thickness, mm: 6

Surface quality: 20-10 SD
S1 Flatness, PV IR S2 Flatness, PV: L/4 PV after coating
Parallelism Face A / Face B: < 5 arcmin
Dimensions, mm: Ø30 (+0/-0.6)
Adhesion and durability: Per MIL-C-675A
Coating S2: AR( Rp<0.3 % ) @532 nm AOI 45 deg
Required documentation: Reflectivity curves (on both surfaces)
Coatings on S1: PR( Rs=50 +/- 2 %) @532 nm AOI 45 deg
Clear aperture: > 90 %
Circumference finish: fine grounding
Damage threshold: > 6 J/cm2 @ 10 ns 10Hz 532 nm

S2: AR(R<1%)@1063 – 1070 nm +AR(R<0,2%)@1535 – 1541 nm, AOI=0 deg
Thickness, mm: 5,0 mm (+/-0,1 mm)

Surface quality: 20-10 S-D
S1: HT(T>98,5%)@1063 – 1070 nm +HR(R>99,8%)@1348 – 1354 nm +PR(R=20 +/- 3 %)@1535 – 1541 nm, AOI=0 deg
Protective chamfers: <0,1 - 0,2 mm x 45 deg
Material: Fused Silica (Suprasil 300)
Diameter, mm: 7,0 mm (+0/-0,1 mm)
Coatings:
Clear aperture: >5,5 mm
S1 Flatness, PV IR S2 Flatness, PV: λ/10 @ 633 nm

S1 Flatness, PV IR S2 Flatness, PV: λ/2 @ 633 nm
Protective chamfers: 0.1-0.2 mm x 45°

Surface quality S1/S2, S-D: 40-20
Wedge / Parallelism error: 0.2° ±0.1° (along 7 mm)
S2: ARp<0.3% @ 266 nm, AOI = 45°
S1(wedge, arrow marks): HRs>99.5% @ 532 nm + HTp>90% @ 266 nm, AOI = 45°
LIDT: >1 J/cm² at 1 ns, 266 nm, >5 J/cm² at 1 ns, 532 nm
Drawing: LP2077-2_rev00
Dimensions, mm: 7 x 6 (+0/-0.1)
Coatings:
Clear Aperture: >90
Chips: <0.1 mm
Thickness (at thin edge), mm: 1 (±0.1)
Material: CaF2 (DUV grade, free of laser induced fluorescence at 266 nm)

S1(): HR>99.5%@ 532 nm + HT>90%@ 266 nm, AOI=0°-5°
Protective chamfers: 0.1 – 0.2 mm x 45°

Thickness, mm: 1 mm (+/-0.1 mm)
Surface quality, S1/S2: 60-40 S-D
S1 Flatness, PV IR S2 Flatness, PV: λ/2@ 633 nm
Parallelism error: <1 arcmin
Material: CaF2 (DUV grade)
LIDT: >1 J/cm2 @ 1 ns, 266 nm, >5 J/cm2 @ 1 ns, 532 nm
Diameter, mm: 6 mm (+0/-0.1 mm)
Coatings:
Chips: <0.1 mm
Clear aperture: >85 %
S2(): AR<0.5%@ 266 nm, AOI=0°-5°

Group Delay Dispersion: ±100 fs²
Material: Fused Silica

Wedge / Parallelism error: <10 arcsec
Thickness, mm: 3 (±0.1)
S1 Flatness, PV IR S2 Flatness, PV: <λ/4 @ 632.8 nm
Damage threshold: > 3J/cm2 @ 300ps 10Hz 800 nm
Adhesion and durability: Per MIL-C-675C
Coatings on S2: AR(Rs<0.25%)@750-850nm
Angle of Incidence (AOI), °: 45
Coatings on S1: PR(Rs=1%±0.5%)@750-850nm
Clear Aperture: >90
Circumference finish: fine grounding
Surface quality, S-D: 40-20
Dimensions, mm: Ø25.4 (+0/-0.5)

S1: HT (T>91%) @ 780-1650 nm + HT (T>88%) @ 720-780 nm, BLOCK (T<0.05%) @ 200-665 nm, AOI=0°
Wedge / Parallelism error: <3 arcmin

Transmitted Wavefront, RMS: ≤λ/4 @ 633nm
S2: AR (R<2.5%) @ 710-1650 nm, AOI=0°
Protective chamfers: 0.1-0.3 mm x 45°
Material: RG665
S1 Flatness, PV IR S2 Flatness, PV: ≤λ @ 633 nm
Dimensions, mm: Ø21 (+0/-0.2) x 3 (±0.1) mm (with two 2 mm bevels cut - according to drawing)
Coatings:
Clear aperture: >80%
Chips: <0.1 mm
Surface quality, S-D: 40-20

Part Number: 11940
S1(IBS,^): HR(Rsp>99.9%, GDDsp<200 fs^2)@ 1030-1060 nm, HT(Ravg<3%)@ 970-983 nm, AOI=10 deg

S2: AR(Ravg<0.2%)@ 970-983 nm, AOI=10 deg
Drawing Number: 11940_Rev00
Coatings:
Part Name: MDCP-25.4-FS-T980/R1040-10

Flatness before: < λ/8 @ 632.8 nm
Thickness, mm: 3 (±0.1)

Surface quality after coatings, S-D: 20-10
S2: No coatings (Tabs > 95% @ 400-1200 nm, AOI=0-45°)
S1: HR(Rabs > 99.5%)@660nm + T(15% > Tabs > 2%)@640nm + HT(Tabs >
Protective chamfers: 0.25-0.5 mm x 45°
LIDT: 10 J/cm2, 10 ns, 10 Hz, @660 nm
S1 Flatness, PV IR S2 Flatness, PV: < 2λ @ 632.8 nm over CA
Dimensions, mm: 35 x 25 (+0/-0.1)
Clear aperture: > 90 %
Material: UVFS

S1: HR(R>99.9%) @ 266+355+532 nm + HT(T>95%) @ 1064 nm
Wedge / Parallelism error: <1 arcmin 

Thickness, mm: 2 (±0.2) 
Surface quality, S-D: 20-20 after coating
Clear Aperture: >90
S1 Flatness, PV IR S2 Flatness, PV: <λ/6 @ 632.8 nm after coating
S2: AR(R<0.25%) @ 1064 nm
Material: UVFS (Corning 7980 0F)
LIDT: >38 mJ @ 1064 nm, 8 ns, 200 Hz, 1 mm beam diameter
LIDT: > 570 uJ @ 1064 nm, 20 ps, 100 kHz, 1 mm beam diameter
Coatings:  
Angle of Incidence, °: 5-10
Dimensions, mm: Ø18 (+0/-0.1) 
Protective chamfers: 0.1-0.3 mm x 45°

Material: BK7
Wedge / Parallelism error: 1°

Transmitted wavefront distortion, PV: λ/6 @ 632nm (λ/30 RMS)
Thickness, mm: 6 (±0.25) (thicker side)
Surface quality, S-D: 20-10
Required documents: Reflectivity curves of face A and B
LIDT: >2.5J/cm2 @ 200ps 10Hz 800nm
Dimensions, mm: Ø50.8 (+0/-0.1)
Coatings S2 ( wedged): AR(Rs<0.3%)@735-870nm
Coatings S1( plano): PR(Rs=50% +/- 2 %)@735-870nm
Clear aperture: >90%
Angle of Incidence (AOI), °: 45
S1 Flatness, PV IR S2 Flatness, PV: λ/6 @ 632nm (λ/30 RMS)

S1: PR=80%(±2%) @ 800-820 nm, AOI = 0°
Thickness, mm: 6 (±0.1)

Surface quality, S-D: 20-10
S2: AR<0.65% @ 730-970 nm, AOI=0°
Protective chamfers: <0.3 mm x 45°
Paralellism error: <1 arcmin
Material: UVFS (C7980)
Diameter, mm: Ø12.7 (+0/-0.1)
Coatings:
Clear Aperture: >90
S1 Flatness, PV IR S2 Flatness, PV: <λ/8 @ 632.8 nm

Clear Aperture: >90
S1 Flatness, PV IR S2 Flatness, PV: <λ/8 @ 632.8 nm

Thickness, mm: 6 (±0.1)
Surface quality, S-D: 20-10
S2: AR<0.65% @ 730-970 nm, AOI=0°
S1: PR=80%(±2%) @ 860-890 nm, AOI = 0°
Protective chamfers: <0.3 mm x 45°
Paralellism error: <1 arcmin
Material: UVFS (C7980)
Coatings:
Diameter, mm: Ø12.7 (+0/-0.1)

Clear Aperture: >90
S1 Flatness, PV IR S2 Flatness, PV: <λ/8 @ 632.8 nm

Thickness, mm: 6 (±0.1)
Surface quality, S-D: 20-10
S1: PR=80%(±2%) @ 970 nm, AOI = 0°
Protective chamfers: <0.3 mm x 45°
Paralellism error: <1 arcmin
Coatings:
S2: AR<0.65% @ 730-970 nm, AOI=0°
Material: UVFS (C7980)
Diameter, mm: Ø12.7 (+0/-0.1)

S1 Flatness, PV IR S2 Flatness, PV: <λ/8 @ 632.8 nm
Wedge / Parallelism error: <1 arcmin

Transmission (s+p)/2 and wavelength, nm: T>95% @ 940
Surface quality, S-D: 20-10
Reflectivity (s+p)/2, %: R>99.5% @ 1030
Material: UVFS
Dimensions, mm: Ø12.7 (+0/-0.1) x 2 (±0.01)
Clear Aperture: >90
Angle of Incidence (AOI), °: 45
Protective chamfers: 0.1-0.3 mm x 45°

S1: HR(Rs>97.0%)@196 nm - 210 nm + HT(Tp>95%)@240 nm - 350 nm + 1100 nm – 1600 nm + HT(Ts>75%)@760 nm – 830 nm + HT(Ts>73%)@1600 nm – 2600 nm , AOI=60°
Thickness, mm: 5.0 mm (+/-0.1 mm)

Surface quality, S1/S2: 10/5 S/D (After coating 20/10 S/D)
S1 Flatness, PV IR S2 Flatness, PV: <λ/10@633 nm (After coating <λ/8@633 nm
S2: uncoated
Parallelism error: <30 arcsec
Material: UVFS (Corning 7980 0F)
Diameter, mm: 20.0 mm (+0.0/-0.1 mm)
Coatings: Low GDD (|GDD|<100fs²)
Clear aperture: >90%
Protective chamfers: <0.25 mm x 45°

Material: BK7
Surface quality, S1/S2: 20/10 S/D

Thickness, mm: 3.0 mm (+/-0.1 mm)|
S1 Flatness, PV IR S2 Flatness, PV: <λ/8@633 nm
S2: AR<0.25%@ 1053-1064 nm AOI= 0
S1: PR=45+/-3%@ 1053-1064 nm AOI=0
Parallelism error: <1 arc min
Diameter, mm: 12.7 mm (+0.0/-0.1 mm)
Clear aperture: >90%
Protective chamfers: <0.25 mm x 45°

Thickness, mm: 5 (±0.1)
Wedge / Parallelism error: <1 arcmin

Transmission (s+p)/2 and wavelength, nm: T>95% @ 1300
Reflectivity (s+p)/2, %: R>99.5% @ 650
Protective chamfers: 0.25 mm x 45°
Material: UVFS
Surface quality, S-D: 20-10
Clear aperture: >90%
S1 Flatness, PV IR S2 Flatness, PV: <λ/8 @ 632.8 nm
Dimensions, mm: Ø25.4 (+0/-0.1)
Angle of Incidence (AOI), °: 45

Clear aperture: >90%
S1: HR(R>99.5%)@515 nm, HT(T>95%)@800 nm, AOI=0°-15°

Surface quality, S1/S2: 10/5 S/D (After coating 20/5 S/D)
Thickness, mm: 6.0 mm (+/-0.1 mm)
S1 Flatness, PV IR S2 Flatness, PV: <λ/10@633 nm (After coating λ/8@633 nm)
S2: AR(R<1%)@700 nm - 900 nm, AOI=0°
Protective chamfers: <0.25 mm x 45°
Parallelism error: <30 arcsec
Material: UVFS (Corning 7980 0F)
Diameter, mm: 12.7 mm (+0.0/-0.1 mm)
Coatings materials: HfO₂+SiO₂
Coatings: E-Beam

Material: UVFS (C7980)
Thickness, mm: 6 (±0.1)

S2(e-beam): ARp<0.2% @ 1030 nm, AOI = 45°
S1/S2 Surface quality, S-D: 20-10
S1(IBS, ^): HRs>99.8% @ 515 nm + HTp>99% @ 1030 nm, AOI = 45°
Parallelism error: <30 arcsec
S1 Flatness, PV IR S2 Flatness, PV: <λ/8 @ 632.8 nm
Dimensions, mm: Ø12.7 (+0/-0.1)
Coatings (design #F):
Clear Aperture: >90
Protective chamfers: <0.3 mm x 45°

LIDT: >10J/cm² for 10 ns pulses, 532 nm
Wedge / Parallelism error: <1 arcmin

Thickness, mm: 9.5 (±0.1)
Surface quality, S-D: 20-10
S2: AR(R<0.5%)@355nm
S1: HR(R>99.5%)@ 1064 + 532nm + HT(T>95%)@355nm
Protective chamfers: 0.1-0.25 mm x 45°
LIDT: >20J/cm² for 10 ns pulses, 1064 nm
S1 Flatness, PV IR S2 Flatness, PV: <λ/8 @ 632.8 nm
Dimensions, mm: Ø19.05 (+0/-0.1)
Coating:
Clear aperture: >90%
Angle of Incidence (AOI), °: 0
Material: UVFS

Material: UVFS (Corning 7980 0F)
Thickness, mm: 2 mm (+/-0.05 mm)

S2 (IBS): AR(R<0.15%)@ 976 nm, AOI=0 deg
S1 (IBS): HR(R>99.9%)@ 1030 nm, HT(T>99%)@ 976 nm, AOI=0 deg
Part Name: W12,7-FS-AR980 HR1040-0
Diameter, mm: 12.7 mm (+0/-0.1 mm)
Coatings:
Clear aperture: 85 % central area
Part Number: 12803

Angle of Incidence (AOI), °: 0
Material: SiO2 Fused Silica

Thickness, mm: 3 (±0.1)
WFD, PV: <λ/10 @ 632.8 nm
Surface quality, S-D: 20-10
S1 Radius of Curvature (ROC), mm: +75
Protective chamfers: 0.2 mm x 45°
S1 Flatness, PV IR S2 Flatness, PV: <λ/10 @ 632.8 nm
Dimensions, mm: Ø5 (+0/-0.1)
Coatings on S2: uncoated, good polishing for optical contacting
Clear aperture: >90%
Coatings on S1: HR(R=96% ±1%)@607+640nm + HT(T>96%)@444nm
LIDT: 50MW/cm2

Material: UVFS
Thickness, mm: 5.0 mm (+/-0.1 mm)

Surface quality, S1/S2: 10/5 S/D (After coating 20/10 S/D)
S1 Flatness, PV IR S2 Flatness, PV: <λ/10@633 nm (After coating <λ/8@633 nm)
S2: uncoated
S1: HR(Rs>95.0%)@210 nm - 230 nm, HT(Tp>90%)@240 nm - 350 nm + (Tp>95%)@760 nm - 830 nm, AOI=60°
Paralleslism error: <30 arcsec
Diameter, mm: 20.0 mm (+0.0/-0.1 mm)
Coatings: E-Beam, fluoride coatings
Clear aperture: >90%
Protective chamfers: <0.25 mm x 45°

Surface quality S1/S2/S3: 20-10 before coating
Zone 3: IBS ARsp<0.1%@ 1061-1067 nm + Tsp>45%@ 630-636 nm AOI=0-5°

Zone 2: IBS PRsp=50+/-2%@ 1061-1067 nm + Rsp>4%@ 630-636 nm AOI=0-2°
Thickness, mm: 6.75
Single pass WFD,RMS: L/10 @632.8nm over 6mm
Beam deviation: <45 arcsec
S4: 60-40 S-D
Material: N-BK7 or equivalent
Dimentions: 33 x 22.3
Zone 1: IBS HRsp>99.9%@ 1061-1067 nm + Rsp>4%@ 630-636 nm AOI=0-2°
Shape: as per drawing

S2: AR(Rs<0.2%)@355 nm, AOI= 45°
S1: PR(Rs=50.0%(+/-1%))@355 nm, AOI= 45°

Thickness, mm: 6.0 mm (+0.0/-0.1 mm)
S2 Surface quality, S-D: 20/10 S/D
S1 Flatness, PV: <λ/10@633 nm per CA (after coating and stress compensation <λ/8@633 nm)
Clear aperture: >90%
Parallelism error: <3 arcmin
Material: UVFS (Corning 7980 0F)
Coatings: S1: IBS, S2: e-Beam + IAD
S1 Surface quality, S-D: 20/10 S/D
Protective chamfers: <0.25 mm x 45°

Material: UVFS (Corning 7980 0F)
S2: AR(Rp<0.2%)@355 nm, AOI= 45°

S2 Surface quality, S-D: Commercially polished
S1 Surface quality, S-D: 20/10 S/D
S1 Flatness, PV: <λ/10@633 nm per CA (after coating and stress compensation <λ/8@633 nm)
Thickness, mm: 6.0 mm (+0.0/-0.1 mm)
S2: AR(Rs<0.2%)@355 nm, AOI= 45°
S1: PR(Rp=50.0%(+/-1%))@355 nm, AOI= 45°
Parallelism error: <3 arcmin
Coatings: S1: IBS, S2: e-Beam + IAD
Clear aperture: >90%
S1: PR(Rs=50.0%(+/-1%))@355 nm, AOI= 45°
Protective chamfers: <0.25 mm x 45°

Dimensions, mm: Ø25.4 x 5
Thickness tolerance, mm: ±0.1 mm

Surface quality: 20-10 S-D
S1 Flatness, PV IR S2 Flatness, PV: <λ- λ/2 @ 632.8 nm
Side2: AR (Ravg<0.65%) @ 940 nm, AOI=45°
Protective chamfers: <0.25 mm x 45°
Diameter tolerance, mm: +0/-0.1 mm
Coatings:
Coating adhesion and durability: Per MIL-C-675A
Clear aperture: >90 %
Side1: HR(Ravg>99,5%) @ 1020-1080 nm + HT (Tp>97%, Ts>93%) @ 940nm, AOI=45°

Material: UVFS (Corning 7980 0F)
Thickness, mm: 3.0 mm (+/- 0.1 mm)

Surface quality, S1/S2: 10/5 S/D (20/10 S/D after coatings)
S1 Flatness, PV IR S2 Flatness, PV: <λ/[email protected] nm
S2: AR(Rp<0.2%)@1030 nm, AOI=45°
S1: PR(Rp=35%(+/-1%)@1030 nm, AOI=45°
Parallelism error: <30 arcsec
Dimensions, mm: 12.5 mm x 20.0 mm (+0.0/-0.1 mm)
Coatings: e-Beam
Clear Aperture: >90%
Protective chamfers: <0.25 mm x 45°

Material: UVFS
Wedge / Parallelism error: < 1 arcmin

Thickness, mm: 3 (±0.1)
Surface quality, S-D: 20-10
S1 Flatness, PV IR S2 Flatness, PV: <λ/8 @ 632.8 nm
S2: AR(R<1%) @ 1064 + 532 nm
Protective chamfers: 0.1-0.3 mm x 45°
LIDT: 150/100/50 mJ @ 1064/532/266 nm; 7 ns; 60 Hz, Beam Ø 5 mm
Dimensions, mm: Ø15 (+0/-0.1)
Coatings:
Clear Aperture: >90
Angle of Incidence, °: 45
S1: HR(Rp>95%) @ 266 nm, HT (Ts>90%) @ 1064+532 nm

Material: UVFS
Thickness, mm: 5 mm (+/-0.1 mm)

Surface quality: 20/10 S/D
S1: PRs(Rs=99%+/-0.5 %)@400 nm, AOI=45 deg
S1 Flatness, PV IR S2 Flatness, PV: L/8@633 nm
Diameter, mm: 25.4 mm (+0/-0.1 mm)
Coatings:
S2: ARs(R<0.4%)@400 nm, AOI=45 deg

Protective chamfers: <0.25 mm x 45°
Thickness, mm: 5 (±0.1)

Surface quality, S-D: 20-10
S1 Flatness, PV IR S2 Flatness, PV: <λ/4 @ 632.8 nm
Wedge / Parallelism error: <1 arcmin
S1: HR (Rs>94%, Rp>88%) @ 200 nm + HT (Tsp>85%) @ 266 nm
Dimensions, mm: Ø25.4 (+0/-0.1)
Coatings:
Clear Aperture: >90
Angle of Incidence, °: 45
Material: UVFS
S2: AR (Rsp<1%) @ 266 nm

Material: UVFS
Wedge / Parallelism error: <1 arcmin

Wavelength, nm: 1064
Surface quality, S-D: 20-10
Protective chamfers: <0.25 mm x 45°
S1 Flatness, PV IR S2 Flatness, PV: <λ/8 @ 632.8 nm
Dimensions, mm: 25.4 (+0/-0.1) x 5 (±0.1)
Clear Aperture: >90
Angle of Incidence (AOI), °: 0-5
Reflectivity, %: 90 (±1%)

Angle of Incidence (AOI), °: 45
Reflectivity (s+p)/2, %: R>99.5% @ 1064

Wedge / Parallelism error: <1 arcmin
Transmission (s+p)/2 and wavelength, nm: T>95% @ 532
Surface quality, S-D: 20-10
Material: UVFS
S1 Flatness, PV IR S2 Flatness, PV: <λ/8 @ 632.8 nm
Dimensions, mm: Ø12.7 (+0/-0.1) x 3 (±0.01)
Clear Aperture: >90
Protective chamfers: <0.25 mm x 45°

S1 Flatness, PV IR S2 Flatness, PV: <λ/6 @ 632.8 nm
Wedge / Parallelism error: <1 arcmin

Thickness, mm: 5 (±0.1)
Surface quality, S-D: 20-10
S2: AR(R<0.2%)@940 nm, AOI=0°
S1: HR(R>99.0%)@1020 - 1040 nm + HT(T>95%)@940, AOI=0°
Material: UVFS
Dimensions, mm: 25 x 10 (+0/-0.1)
Coatings: e-Beam
Clear aperture: >90%
Protective chamfers: 0.1-0.3 mm x 45°

Material: UVFS
Wedge / Parallelism error: <1 arcmin

Transmission (s+p)/2 and wavelength, nm: T>95% @ 515
Thickness, mm: 3 (+/-0.1)
Surface quality, S-D: 20-10
Protective chamfers: <0.25 mm x 45°
S1 Flatness, PV IR S2 Flatness, PV: <λ/8 @ 632.8 nm
Clear Aperture: 90
Aperture dimensions, mm: 10 x 20 (+0/-0.1)
Angle of Incidence (AOI), °: 45
Reflectivity (s+p)/2, %: R>99.5% @ 1030

S1: HR(Rs>90%)@190 nm - 210 nm, HT(Tp>90%)@257 nm + HT(Tp>95%)@720 nm - 1150 nm, AOI=60°
Clear aperture: >90%

Thickness, mm: 5.0 mm (+/-0.1 mm)
Surface quality, S1/S2: 10/5 S/D (After coating 20/10 S/D)
S1 Flatness, PV IR S2 Flatness, PV: <λ/10@633 nm (After coating λ/8@633 nm)
S2: AR(Rp<0.4%)@257 nm + AR(Rp<0.4%)@720 nm - 1150 nm, AOI=60°
Parallelism error: <30 arcsec
Material: UVFS
Diameter, mm: 20.0 mm (+0.0/-0.1 mm)
Coatings: E-Beam, Low GDD
Protective chamfers: <0.25 mm x 45°

ROC, S1: -300.0 mm (±1%)
Surface quality, S1/S2: 10/5 S/D (20/10 S/D after coating)

Surface irregularity, P-V, S1: <λ/4@633 nm
Surface flatness, P-V, S2: <λ/4@633 nm (after coating <λ/4@633 nm)
S2: AR(R<0.2%)@976 nm, AOI=0°
ROC, S2: infinty
Protective chamfers: <0.25 mm x 45°
Material: UVFS (Corning 7980 0F)
Edge thickness, mm: 5.0 mm (+/-0.1 mm)
Coatings: e-Beam
Clear aperture: >90%
Centration error:   <1 arcmin
S1: HR(R>99.0%)@1030 nm + HT(T>95%)@976, AOI=0°

Protective chamfers: <0.25 mm x 45°
S1: HR(R>99.0%)@1030 nm + HT(T>95%)@976, AOI=0°

Surface quality, S1/S2: 10/5 S/D (20/10 S/D after coating)
Surface irregularity, P-V, S1: <λ/4@633 nm
Surface flatness, P-V, S2: <λ/4@633 nm (after coating <λ/4@633 nm)
S2: AR(R<0.2%)@976 nm, AOI=0°
Centration error:   <1 arcmin
Material: UVFS (Corning 7980 0F)
Edge thickness, mm: 5.0 mm (+/-0.1 mm)
Coatings: e-Beam
Clear aperture: >90%
ROC, S2: infinty
ROC, S1: -400.0 mm (±1%)

Clear aperture: >90%     
S1: HR(R>99.5%)@500-530 nm + HT(T>85.0%)@630-650 nm + HT(T>90%)@650-1300 nm, AOI=0°-15°

Thickness, mm: 2.0 mm (+/-0.1 mm) 
S1 Surface quality, S-D: 10/5 S/D (After coating 20/10 S/D)   
S1 Flatness, PV: <λ/10@633 nm (After coating <λ/8@633 nm)  
S2: AR@630-1300 nm, AOI=0°-15°
Parallelism error: <30 arcsec      
Material: UVFS 
Diameter, mm: 12.7 mm (+0.0/-0.1 mm)         
Coatings: e-Beam, high LIDT
Protective chamfers: <0.25 mm x 45°      

LIDT: 15 J/cm^2, 1064 nm, 10 ns, 50 Hz
S1: PR(Rp=99.985% +/-0.01%, GDDp<20fs^2)@ 1064 nm, AOI=45 deg, electric field optimized

Thickness, mm: 6.35
Thickness tolerance, mm: ±0.1
S2 Surface quality, S-D: 10-5 S-D
S1 Surface quality, S-D: 10-5 S-D
Substrate: 1-OS-2-0254-635-P
S2: uncoated
Wedge/parallelism error: <5 arcsec
S2 Flatness, PV: <λ/10 @ 632.8 nm per CA
Clear aperture: >90%
Overall transmission: Tp=0.025% +/-0.01% @ 1064 nm, AOI=45 deg
Chips, mm: <0.3
S1 Transmitted wavefront distortion, TWD: <λ/10 @ 632.8 nm per CA
Coatings:
Dimension tolerance, mm: +0/-0.1
Dimensions, mm: Ø25.4
Material: UVFS (Corning 7980 0F)
Protective chamfers: 0.1-0.25 mm x 45°
S1 Flatness, PV: <λ/10 @ 632.8 nm per CA

S2: HR (R > 99 %) @ 1053 nm + 1064 nm + HT (R < 4 %) @ 990 – 1010 nm, AOI 44 – 46° MS
S1: AR (R < 0.6 %) @ 990 – 1010 nm, AOI 44 – 46° MS

Wedge / Parallelism error: <1 arcmin
Transmitted wavefront distortion, PV: <λ/6 @ 632.8nm (after coating)
Clear Aperture: >90
Material: UVFS Corning 7980 0F grade
Dimensions, mm: Ø76.2 (±0.1) x 2 (±0.1)
Coatings:
Protective chamfers: 0.25 mm x 45°
Surface quality, S-D: 20 – 10 / 20 – 20 (after coating)

Protective chamfers: <0.25 mm x 45°
Thickness, mm: 3.0 mm (+/-0.1 mm)

Surface quality, S1/S2: 10/5 S/D (20/10 S/D after coating)
S1 Flatness, PV IR S2 Flatness, PV: <λ/10@633 nm (after coating λ/8@633)
S1: HR(R>99.5%)@1064 nm + HT(T>95%)@532 nm, AOI=45°
Parallelism error: <1 arcmin
Material: UVFS (Corning 7980 0F)
Diameter, mm: 12.7 mm (+0/-0.1 mm)
Customer reference: ALS-OP-0024-B
Coatings: e-Beam + IAD, HfO₂ + SiO₂
Clear aperture: >90%
S2: AR(R<0.65%)@532 nm, AOI=45°

Material: UVFS
S2: AR<2% @ 1000-2200 nm, AOI = 45°

S1/S2 Surface quality before coating, S-D: 20-10
S1/S2 Surface quality after coating, S-D: 20-20
S1/S2 Surface flatness , PV: <λ/8 @ 632.8 nm
S1(^): PR(R = 70% ±10%, T = 30% ±10% ) @ 1000-2200 nm, AOI = 45°
Parallelism error: <1 arcmin
Thickness, mm: 3 (±0.1)
LIDT: >3 J/cm² @ 1064 nm, 10 ns, 10 Hz
Dimensions, mm: Ø25.4 (+0/-0.1)
Coatings:
Clear Aperture: >90
Protective chamfers: <0.25 mm x 45°

S1(^): PR(R = 70% ±10%, T = 30% ±10% ) @ 1000-2200 nm, AOI = 45°
Thickness, mm: 2 (±0.1)

S2: AR<2% @ 1000-2200 nm, AOI = 45°
S1/S2 Surface quality before coating, S-D: 20-10
S1/S2 Surface quality after coating, S-D: 20-20
S1/S2 Surface flatness , PV: <λ/8 @ 632.8 nm
Protective chamfers: <0.25 mm x 45°
Parallelism error: <1 arcmin
Material: UVFS
LIDT: >3 J/cm² @ 1064 nm, 10 ns, 10 Hz
Dimensions, mm: Ø25.4 (+0/-0.1)
Clear Aperture: >90
Coatings:

Parallelism error: <1 arcmin
S2: HRp>95% @ 520 nm + HTsp>98% @ 1040 nm, AOI = 45°

Surface quality, S-D: 20-10
Protective chamfers: <0.25 mm x 45°
S1 Flatness, PV IR S2 Flatness, PV: <λ/8 @ 632.8 nm
Dimensions, mm: Ø25.4 (+0/-0.1) x 5 (±0.1)
Coatings:
Clear Aperture: >90
S1(^): HRsp>95 @ 1040 nm + HTp>98% @ 520 nm, AOI = 45°
Material: UVFS (Corning 7980 0F)

S1: HR (R>99%) @ 257 nm + HT (T>95%) @ 515 nm, AOI=45 deg
S2: AR (R<0.65%) @ 515 nm, AOI=45 deg

Surface flatness after coatings: L/8 @ 632.8 nm over CA (PV)
LIDT target (real values can be confirmed only after testing elements):
Dimensions, mm: Ø30 x 5mm
Clear aperture (CA): >90%
Surface quality after coatings: 20-10 S-D
Material: UVFS

S1 ROC: -1000mm +/- 50mm
S/D after coating: 20/10

S2 ROC: plano
S2 (BK7->YAG): AR (R<1,5%) @1064nm AOI 0-5deg +AR (R<2%)780-830nm, AOI 0-5deg
Clear Aperture: >85%
LIDT: LIDT>15J/Cm2 1064 10ns
Edge Thickness, mm: 3
Dimensions, mm: Ø6
S1: (AIR->BK7) HR(R>99,5%)@1064nm, AOI 0 deg +HT (T>95%)@780-830nm, AOI 0-30deg
Material: N-BK7

Protective chamfers: <0.25 mm x 45°
Surface quality after coating, S-D: 20-10

Wedge / Parallelism error: <5 arcsec
Surface flatness after coating: <λ @ 632.8 nm
S2: BBAR (R<1.2%) @ 1400-1900 nm
S1: HR (Rp>99%) @ 770-830 nm + HT (Tp>96%) @ 1400-1600 nm + HT (Ts>95%) @ 1600-1900 nm
LIDT: 0.2 J/cm2, 40 fs, 100hz @ 800 nm
Dimensions, mm: Ø25.4 x 2 mm
Coatings:
Angle of Incidence (AOI), °: 45 deg
Clear aperture: >90%
Material: UVFS

Rs-Rp, %: 10%
Wedge / Parallelism error: <1 arcmin

Wavelength, nm: 532
Transmitted wavefront distortion, PV: <λ/8 @ 632.8 nm
Surface quality, S-D: 20-10
Protective chamfers: <0.25 mm x 45°
Material: UVFS
Dimensions, mm: Ø25.4 (+0/-0.1) x 5 (±0.1)
Clear Aperture: >90
Angle of Incidence (AOI), °: 45
Reflectivity, Rsp %: 20 ±5

Material: UVFS
Wedge / Parallelism error: <1 arcmin

Wavelength, nm: 532
Transmitted wavefront distortion, PV: <λ/8 @ 632.8 nm
Surface quality, S-D: 20-10
Rs-Rp, %: 10%
Protective chamfers: <0.25 mm x 45°
Dimensions, mm: Ø30 (+0/-0.1) x 5 (±0.1)
Clear Aperture: >90
Angle of Incidence (AOI), °: 45
Reflectivity, Rsp %: 20 ±5

S1: HR (R>99.5%) @ 1000-1060 nm, AOI = 45 deg, GDD, fs²: <20
Thickness, mm: 5 (+/-0.2mm)

S2: uncoated
Pyramidal tolerance: <1 arcmin
Material: UVFS
S1 Flatness, PV IR S2 Flatness, PV: L/6 per 90% CA
Coatings:
Clear Aperture: >90%
Clear Aperture: 20x40 (+0/-0.1)
90° angle tolerance: ±30 arcsec
Surface quality: 40-20 S-D

S1 Flatness, PV IR S2 Flatness, PV: <λ/10@633 nm
Wedge / Parallelism error: <30 arcsec.

Clear aperture: >90%
Surface quality, S1/S2: 20/10 S/D
S2: ARp<0,25% @ 1053-1064 nm; AOI=45 deg
S1: HRp>96% @ 805 nm+Rp<1.5 %@1053-1064 AOI=45 deg
Protective chamfers: <0.25 mm x 45°
Material: BK7
LIDT: >10 J/cm^2
Diameter, mm: 12.7 mm (+0.0/-0.1 mm)
Thickness, mm: 3.0 mm (+/-0.1 mm)|

Parallelism error: <1 arcmin
S2: AR<0.5% @ 355 nm, AOI = 0 ± 5°

S1: HR>99.5% @ 1064 nm + HT>95% @ 355 nm, AOI = 0 ± 5°
S1/S2 Surface quality, S-D: 40-20 (after coating)
S1/S2 Surface flatness: < λ/2 @ 633 nm
Protective chamfers: 0.1-0.2 mm x 45°
LIDT: >1 J/cm² @ 355 nm, 1 ns
Drawing ID: LP2030_rev04
Dimensions, mm: 5 x 5 (+0/-0.1)
Coatings:
Clear Aperture: 4 x 4
Chips: <0.1 mm
Material: UVFS (Corning 7980 0F)
Thickness, mm: 1 (±0.1)

Protective chamfers:
Wedge / Parallelism error: 30 ±5 arcmin (marked ^)

Thickness, mm: 5 (±0.1)
Surface quality, S-D: 20-10
Surface flatness, P-V: λ/8 @ 632. 8 nm
S1: PR (P=92 ±1%) @ 1030 nm, AOI = 0°
Protective chamfers: 0.1-0.3 mm x 45°
Material: UVFS
Dimensions, mm: Ø12.7 (+0/-0.1)
Coatings:
Clear Aperture: >90
S2(^): AR (R<0.25%) @ 1030 nm, AOI = 0°

Chips: <0.2 mm
S1: HRp>99.8% @ 513-534 nm, HTs>97% @ 1025-1070 nm, AOI=43-47 deg (sputtering technology)

S2: AR(Rs<0.6%)@ 1025-1070 nm, AOI=43-47 deg (sputtering technology)
S1 Flatness, PV IR S2 Flatness, PV: Surface quality, S1/S2: 20-10 S-D
Surface roughness (RMS), S1/S2: <10 angstrom
Transmitted wavefront distortion, PV: Part Number: M0226-1141-02 revA
Thickness, mm: 4 mm (+/-0.1 mm)
Coatings:
Parallelism error: <1 arcmin
Clear aperture: >14.4 mm diameter, central area
Chamfer: 0.1-0.25 mm x 45 deg
Diameter, mm: 16 mm (+0/-0.1 mm)
LIDT: 3 mJ/cm^2, 1030 nm, 500 fs
LIDT: 3 mJ/cm^2, 515 nm, 500 fs
Material: UVFS (Corning 7980 0A)

Surface quality, S1/S2: 20/10 S/D (after coating 20/10 S/D)
Thickness, mm: 5.0 mm (+/-0.1 mm)

Protective chamfers: <0.25 mm x 45°
S1 Flatness, PV IR S2 Flatness, PV: <λ/10@633 nm (after coating <λ/8@633 nm)
S2: AR(Ravg<1%)@515 nm + 1030 nm, AOI=45°
S1: HR(Ravg>99.0%)@257 nm, HT(Tavg>90.0%)@515 nm + 1030 nm, AOI=45°
Material: UVFS (Corning 7980 0F)
Item:
Diameter, mm: 25.4 mm (+0.0/-0.1 mm)
Coatings: e-Beam
Clear aperture: >90%
Parallelism error: <1 arcmin

S1: DHR(Rs>99.8%, Rp>99.5%)@515 + 1030 nm, AOI= 45°
S1 Surface quality, S-D: 20/10 S/D (40/20 S/D after coating)

Thickness, mm: 3.0 mm (+/-0.1 mm)
S1 Flatness, PV: <λ/10@633 nm per CA (after coatings <λ/4@633 nm)
S2: uncoated
Parallelism error: <3 arcmin
Material: UVFS
Diameter, mm: 12.7 mm (+0.0/-0.1 mm)
Coatings: MS
Clear aperture: >90%
Protective chamfers: <0.25 mm x 45°

Parallelism error: <3 arcmin
Clear aperture: >90%

Thickness, mm: 6.0 mm (+/-0.1 mm)
S1 Surface quality, S-D: 20/10 S/D (40/20 S/D after coating)
S1 Flatness, PV: <λ/10@633 nm per CA (after coatings <λ/4@633 nm)
S2: DAR(Rsp<1.0%)@515+1030, AOI= 45°
Protective chamfers: <0.25 mm x 45°
Material: UVFS
Diameter, mm: 38.1 mm (+0.0/-0.1 mm)
Coatings: S1:MS, S2:e-Beam
S1: DHR(Rs>99.8%, Rp>99.5%)@515 + 1030 nm, AOI= 45°

Parallelism error: <1 arcmin
Thickness, mm: 2 (±0.1)

Surface quality S1/S2, S-D: 20-10
S1 Flatness, PV IR S2 Flatness, PV: < λ/6 @ 632.8 nm
S2: AR (R<0.4%) @ 266 nm, AOI=0-10°
Protective chamfers: 0.1-0.3 mm x 45°
Material: UVFS (Corning 7980 0F)
LIDT: > 10J/cm2 10ns 10 Hz @ 800nm
Dimensions, mm: Ø 25.4 (+0/-0.1)
Coating: e-beam
Clear aperture: >90%
S1: HR (R>99%) @ 400+800nm + HT (T>80%) @ 266nm, AOI=0-10°

LIDT: > 10J/cm2 10ns 10 Hz @ 800nm
S1: HR (R>99%) @ 266+400nm + HT (T>95%) @ 800nm, AOI=0-10°

Thickness, mm: 2 (±0.1)
Surface quality S1/S2, S-D: 20-10
S1 Flatness, PV IR S2 Flatness, PV: < λ/6 @ 632.8 nm
S2: AR (R<0.25%) @ 800nm, AOI=0-10°
Clear aperture: >90%
Material: UVFS (Corning 7980 0F)
Dimensions, mm: Ø 25.4 (+0/-0.1)
Coating: e-beam
Parallelism error: <1 arcmin
Protective chamfers: 0.1-0.3 mm x 45°

Transmission and wavelength, nm: T>95% @ 1064 nm
Wedge / Parallelism error: <1 arcmin

Surface quality, S-D: 20-10
Shape: -
Reflection and wavelength, nm: R>99.5% @ 1572 nm
Protective chamfers: <0.25 mm x 45°
S1 Flatness, PV IR S2 Flatness, PV: <λ/8 @ 632.8 nm
Dimensions, mm:
Dimensions, mm:   Ø12.7 (+0/-0.1) x 5 (±0.1)
Coatings on S1: -
Clear Aperture: >90
Angle of incidence (AOI), °: 0
Material: UVFS

S1 Flatness, PV IR S2 Flatness, PV: <λ/8 @ 632.8 nm
Wedge / Parallelism error: <1 arcmin

Transmission and wavelength, nm: T>95% @ 1572 nm
Surface quality, S-D: 20-10
Shape: -
Reflection and wavelength, nm: R>99.5% @ 1064 nm
Angle of incidence (AOI), °: 0
Material: UVFS
Dimensions, mm:
Dimensions, mm:   Ø12.7 (+0/-0.1) x 5 (±0.1)
Coatings on S1: -
Clear Aperture: >90
Protective chamfers: <0.25 mm x 45°

S1: PR (R= 1±0.4%) @ 515 + 1028 nm
Wedge / Parallelism error: <1arcmin

S2: AR (R<1%) @ 515 nm + AR (R<0.7%) @ 1028 nm
Clear Aperture: >90
Material: UVFS (Corning 7980 0F)
Dimensions, mm: Ø25.4 (+0/-0.1) x 5 (±0.1)
Coatings:
Protective chamfers: 0.1-0.25 mm x 45°
Surface quality, S-D: 20-10

Material: UVFS (Corning 7980 0F)
Wedge / Parallelism error: <1arcmin

Surface quality, S-D: 20-10
S2: AR (R < 0.65%) @ 343 nm
Protective chamfers: 0.1-0.25 mm x 45°
Dimensions, mm: Ø25.4 (+0/-0.1) x 5 (±0.1)
Coatings:
Clear Aperture: >90
S1: PR (R = 1±0.3%) @ 343 nm

Wedge / Parallelism error: <1 arcmin
Transmission (s+p)/2 and wavelength, nm: T>95% @ 1030

Protective chamfers: <0.25 mm x 45°
Reflectivity (s+p)/2, %: R>99.5% @ 515
S1 Flatness, PV IR S2 Flatness, PV: <λ/8 @ 632.8 nm
Dimensions, mm: Ø25.4 (+0/-0.1) x 6 (±0.1)
Clear Aperture: >90
Angle of Incidence (AOI), °: 45
Surface quality, S-D: 20-10
Material: UVFS

S1 Flatness, PV IR S2 Flatness, PV: λ/10 (before coating), λ (after coating)
Thickness, mm: 3 (±0.1)

Surface quality, S-D: 20-10 (before coating), 20-20 (after coating)
S2: AR (R<0.25%) @1898-1918 + AR (R<0.65%) @ 2075-2105, AOI = 0-10°
S1: HR (R>99.8%) @ 2075-2105 nm (centered at 2090 nm) + (R<4%) @1898 - 1918 nm (centered at 1908 nm ), AOI=0-2°
Revised PN: AR19-P2132511-119
LIDT: >15 J/cm2 @ 2090nm, 10ns 100Hz
Dimensions, mm: 12.7 (±0.1)
Coatings:
Material: Infrasil 301

Revised PN: AR19-P2132511-111
Thickness, mm: 3 (±0.1)

Surface quality, S-D: 20-10 (before coating), 20-20 (after coating)
S1: HR>99.8 % @ 1900-1915 nm + R<5% @785-800 nm, AOI = 40-50
Material: Infrasil 301
S1 Flatness, PV IR S2 Flatness, PV: <λ/10 (before coating), <λ (after coating)
Diameter, mm: 12.7 (±0.1)
Coatings:
S2: AR<1%@785-800 nm, AOI = 40-50

LIDT: >1 GW/cm2 for 10 ns pulses @ 1064 nm, 10 Hz
Wedge / Parallelism error: <5 arcmin

Wavelength, nm: 1064
Surface quality, S-D: 20-10
Reflectivity, %: 60 (±1%)
Material: UVFS
S1 Flatness, PV IR S2 Flatness, PV: <λ/10 @ 632.8 nm
Dimensions, mm: Ø25.4 (+0/-0.1) x 5 (±0.1)
Clear Aperture: >90
Angle of Incidence (AOI), °: 0-5
Protective chamfers: <0.25 mm x 45°

LIDT: >1 GW/cm2 for 10 ns pulses @ 1064 nm, 10 Hz
Wavelength, nm: 1064

Surface quality, S-D: 20-10
Reflectivity, %: 50 (±1%)
Wedge / Parallelism error: <5 arcmin
S1 Flatness, PV IR S2 Flatness, PV: <λ/10 @ 632.8 nm
Dimensions, mm: Ø25.4 (+0/-0.1) x 5 (±0.1)
Clear Aperture: >90
Angle of Incidence (AOI), °: 0-5
Protective chamfers: <0.25 mm x 45°
Material: UVFS

LIDT: >1 GW/cm2 for 10 ns pulses @ 1064 nm, 10 Hz
Wedge / Parallelism error: <5 arcmin

Wavelength, nm: 1064
Surface quality, S-D: 20-10
Reflectivity, %: 80 (±1%)
Material: UVFS
S1 Flatness, PV IR S2 Flatness, PV: <λ/10 @ 632.8 nm
Dimensions, mm: Ø25.4 (+0/-0.1) x 5 (±0.1)
Clear Aperture: >90
Angle of Incidence (AOI), °: 0-5
Protective chamfers: <0.25 mm x 45°

Material: UVFS
Wavelength, nm: 1064

Protective chamfers: <0.25 mm x 45°
Reflectivity, %: 30 (±1%)
Wedge / Parallelism error: <5 arcmin
S1 Flatness, PV IR S2 Flatness, PV: <λ/10 @ 632.8 nm
Dimensions, mm: Ø25.4 (+0/-0.1) x 5 (±0.1)
Clear Aperture: >90
Angle of Incidence (AOI), °: 0-5
LIDT: >1 GW/cm2 for 10 ns pulses @ 1064 nm, 10 Hz
Surface quality, S-D: 20-10

LIDT: >1 J/cm2 @ 351 nm, >2 J/cm2 @526.5 nm, >5 J/cm2 @ 1053 nm (3 ns pulses)
Surface quality: 20-10 S-D

S2: AR<1% @1053 + AR<1.5% @351+526.5, AOI=43-47°
S1: HR(Rsp>98%) @263 + HT(Tp>98%, Ts>97%) @351+526.5+1053nm , AOI=43-47°
Material: UVFS
S1 Flatness, PV IR S2 Flatness, PV: <λ/8 @633 over CA
Dimensions, mm: Ø15 (+0/-0.5) x 3 (±0.1)
Coatings:
Clear aperture: >90% of diameter
Parallelism error: <3 arc minutes

Clear aperture: >90
S1: HR (R>98%) @ 355 nm + HT (T>95%) @ 532+1064

Wedge / Parallelism error: <1 arcmin
Thickness, mm: 6
Thickness tolerance, mm: ±0.1
Surface quality, S-D: 20-10
S2: AR(R<1%)@1064+532nm
Protective chamfers: <0.25 mm x 45°
Material: UVFS
LIDT: >5J/cm2 for 10 ns at 1064 nm, 532 nm
S1 Flatness, PV IR S2 Flatness, PV: <λ/8 @ 632.8 nm
Dimensions tolerance, mm: (+0/-0.1)
Dimensions, mm: Ø50.8

Protective chamfers: <0.25 mm x 45°
Thickness tolerance, mm: ±0.1

Thickness, mm: 6
Surface quality, S-D: 20-10
S2: AR(R<1%)@355+532nm
S1: HR (R>98%) @ 1064 nm + HT (T>98%) @ 532+ HT (T>97%) 355
LIDT: >8J/cm2 for 10 ns at 532nm, 1064 nm
S1 Flatness, PV IR S2 Flatness, PV: <λ/2 @ 632.8 nm
Dimensions, mm: Ø25.4
Clear aperture: >90
Dimensions tolerance, mm: (+0/-0.1)
Wedge / Parallelism error: <1 arcmin
Material: UVFS

ROC S1, mm: plano
Dimensions, mm: Ø70x6 mm

Surface Quality, S-D: 20-10 (before & after coatings)
S1 Flatness, PV IR S2 Flatness, PV: λ/8 @ 632.8 nm (before & after coatings)
S2: AR (R<0.65%) @ 615-650 nm + stress compensation, AOI 45°
LIDT: 300 fs-10 ps, 100 μj, 10 mm (beam diameter), 10 W @ 515 nm
Clear aperture: > 90 %
Coatings:
Material: UVFS

Diameter, mm: 25.4 mm (+0.0/-0.1 mm)         
Thickness, mm: 5.0 mm (+/-0.1 mm) 

Surface quality, S1/S2: 10/5 S/D (After coating 20/10 S/D)
S1 Flatness, PV IR S2 Flatness, PV: <λ/10@633 nm (After coating <λ/8@633 nm)       
S2: uncoated
S1: HR(Rs>99.0%)@240 nm - 290 nm + HT(Tp>97%)@460 nm -580 nm +HT(Tp>95%)@1100 nm – 1600 nm + HT(Ts>75%)@760 nm – 830 nm + HT(Ts>65%)@1600 nm – 2600 nm , AOI=60°
Protective chamfers: <0.25 mm x 45°      
Material: UVFS (Corning 7980 0F) 
Coatings: e-Beam, Low GDD (|GDD, Rs|<30fs²)        
Clear aperture: >90%     
Parallelism error: <30 arcsec      

Coatings:
Wedge / Parallelism error: <1 arcmin

Thickness, mm: 5
Thickness tolerance, mm: ±0.1
Surface quality, S-D: 20-10
S1: HR(R>99%)@400-700 nm + HT(T>95%) @ 1064 nm
S2: AR(R<0.65%) @ 1064 nm
Material: UVFS
Dimensions tolerance, mm: (+0/-0.1)
Dimensions, mm: Ø38.1
Clear aperture: >90
Angle of Incidence (AOI), °: 45 deg
Protective chamfers: <0.25 mm x 45°

S2: AR (R<0.2%) @ 1029-1031 nm, AOI = 0°
Thickness of thicker edge, mm: 3.1 (±0.1)

S2 LIDT: 20 J/cm² @ 1030 nm, 10ns, 100 Hz
S1/S2 Test area, mm: Ø2
S1/S2 Surface quality: 5/ 2 x 0.016
S1/S2 Surface form error, fr: 3/ 0.4 (0.2) after coating
S1(^): PR (R=60% ±2%) @ 1029-1031 nm, AOI = 0°
Protective chamfers: 0.1-0.3 mm x 45°
Perpendicularity to A surface: 0.01 mm
Parallelism to B surface: 0.02 mm
Material: C7979
Dimensions, mm: 8 x 6 (±0.1)
Coatings: IBS
S1 LIDT: 60 J/cm² @ 1030 nm, 10ns, 100 Hz
Wedge along 8 mm side: 1° (±0.016°)

Protective chamfers: <0.25 mm x 45°
Wedge / Parallelism error: <1 arcmin

Wavelength, nm: 355
Transmitted wavefront distortion, PV: <λ/8 @ 632.8 nm
Surface quality, S-D: 20-10
Reflectivity, Rsp %: 5 ± 0.75% (Tsp=95% ± 0.75%)
Material: UVFS
Dimensions, mm: Ø25.4 (+0/-0.1) x 5 (±0.1)
Coating technology: IBS
Clear Aperture: >90
Angle of Incidence (AOI), °: 45
Rs-Rp, %: <1%

Parallelism error: <10 arcsec
Thickness, mm: 3 (±0.1)

S2: AR (Rs<0.65%) @ 2080-2100nm, AOI=40-48°
S1: PR (Rs=10±2%) @ 2080-2100nm, AOI=40-48°
S1, S2 Surface quality, S-D: 40-20
Perpendicularity: <2 arcmin
LIDT: >15 J/cm2 @ 2090nm, 10ns, 100Hz
S1 Flatness, PV IR S2 Flatness, PV: λ/6 (before coating), λ/2-λ (after coating)
Dimensions, mm: 12.7 (±0.1)
Coatings:
Clear Aperture: >Ø 10.7mm
Protective chamfers: <0.2mm x 45°
Material: Lithotec CaF2

S2: AR (R<0.1%) @ 532nm, AOI=45° + stress compensation
Clear aperture: >90%

Thickness, mm: 6.35 (±0.1 mm)
Surface quality: 10-5 S-D
S1 Flatness, PV IR S2 Flatness, PV: <λ/10 @ 632.8 nm
S1: HR (Rs>99.9%) @ 589nm + HT (Tp>97.5%) @ 532nm, AOI=45°
Protective chamfers: <0.25 mm x 45°
Material: UVFS
LIDT: >2 J/cm2 @ 532+589nm, 20ns, 10Hz. Average power <20W
Coatings:
Diameter, mm: 25.4 (+0/-0.1 mm)

Thickness, mm: 6.5 (±0.1)
Surface quality S2, S-D: 20-10

Surface quality S1, S-D: 20-10
S2: AR (R<0.1%) @ 808 nm
LIDT: >800 MW/cm2 or >10J/cm2, 10 ns, 10 kHz, 1064 nm
S1: HT (T>99.65%) @ 808 nm + HR (R>99.9%) @ 1064 + 1159 + 1180 nm
Material: JGS1
S1 Flatness, PV IR S2 Flatness, PV: < λ/8 @ 632.8 nm
Dimensions, mm:   Ø12.7 (+0/-0.1)
Coatings:
Clear Aperture: > 90%
Parallelism error: <3 arcmin
Protective chamfers: <0.25 mm x 45°

ROC of S1: infinity
Surface quality, S-D S2: 40-20

Surface quality, S-D S1: 40-20
S1 Flatness, PV IR S2 Flatness, PV:   <λ/4 @ 632.8 nm
S2: HR (R>99.3%) @ 289.8 + 295 nm + HT (T>97%) @ 579.5 + 590 nm
S1: HT (T>99.7%) @ 579.5 + 590 nm + HR (R>99.9%) @ 1064 + 1159 + 1180 nm
ROC of S2: +50 mm
Clear Aperture: > 90%
ROC tolerance: 3 fringes
Centration error: <3 arcmin
Protective chamfers: <0.25 mm x 45°
Coatings:
Wavelength, nm: 632.8
Dimensions, mm:   Ø12.7 (+0/-0.1)
LIDT: >800 MW/cm2 or >10J/cm2, 10 ns, 10 kHz, 1064 nm
Material: UVFS
Center thickness, mm: 6.5 (±0.1)

ROC of S2: +70 mm
Dimensions, mm:   Ø12.7 (+0/-0.1)

Surface quality, S-D S2: 40-20
Surface quality, S-D S1: 40-20
S1 Flatness, PV IR S2 Flatness, PV:   <λ/4 @ 632.8 nm
S2: HR (R>99.3%) @ 289.8 + 295 nm + HT (T>97%) @ 579.5 + 590 nm
S1: HT (T>99.7%) @ 579.5 + 590 nm + HR (R>99.9%) @ 1064 + 1159 + 1180 nm
ROC tolerance: 3 fringes
Protective chamfers: <0.25 mm x 45°
Center thickness, mm: 6.5 (±0.1)
LIDT: >800 MW/cm2 or >10J/cm2, 10 ns, 10 kHz, 1064 nm
Centration error: <3 arcmin
Wavelength, nm: 632.8
Coatings:
Clear Aperture: > 90%
ROC of S1: infinity
Material: UVFS

S1: PR (R=95(+/-3.5%)) @ 597.5 + 590 nm + HR (R>99%) @ 289.8 + 295 nm
Thickness, mm: 6.5 (±0.1)

Surface quality S2, S-D: 20-10
Protective chamfers: <0.25 mm x 45°
S2: AR (R<0.2%) @ 597.5 + 590 nm
Surface quality S1, S-D: 20-10
Material: UVFS
Clear Aperture: > 90%
LIDT: >800 MW/cm2 or >10 J/cm2, 10 ns, 10 kHz @ 1064 nm
S1 Flatness, PV IR S2 Flatness, PV: < λ/8 @ 632.8 nm
Dimensions, mm:   Ø12.7 (+0/-0.1)
Coatings:
Parallelism error: <3 arcmin

LIDT: >500 MW/cm2 or >10J/cm2, 10 ns, 10 kHz, 1064 nm
Wedge / Parallelism error: <1arcmin

Surface quality, S-D: 20-10
S2: AR (Rs<0.2%) @ 532 nm
S1: HR (Rp>99%) @ 355 nm + HT (Ts>95%) @ 532 nm
Material: JGS1
S1 Flatness, PV IR S2 Flatness, PV: <λ/8 @ 632.8nm
Dimensions, mm: Ø25.4 (+0/-0.1) x 5 (±0.1)
Clear Aperture: >90
Protective chamfers: 0.1-0.25 mm x 45°

S1/S2 Surface quality, S-D: 40-20
Clear Aperture: >95

S2: AR (Ravg<3%) @ 450-820 nm + AR (R<1.5%) @ 1070 nm, AOI = 45° + stress compensating layer
S1/S2 Surface flatness: <λ/8-λ/7 @ 633 nm after coating
S1/S2 Surface flatness: <λ/10 @ 633 nm before coating
Protective chamfers: 0.1-0.3 mm x 45°
Parallelism error: <5°
Coatings: MS
Material: UVFS (Corning 7980 0F)
Dimensions, mm: Ø85 (+0/-0.1)
S1(^): HR (Ravg>99.9%) @ 1070 nm + HT (Tavg>95%) @ 450-820 nm, AOI = 45°
Thickness, mm: 12.7 (±0.1)

Wedge / Parallelism error: <5 arcsec
S1: PR (Rp=50 ±1%) @ 1023-1033 nm

Transmitted wavefront distortion, PV: < λ/8 (PV) @632.8nm
Surface quality, S-D: 20-10
S2: AR (R<0.65%) @ 1023-1033 nm
Protective chamfers: <0.25 mm x 45°
Material: UVFS Corning 7980 OF grade
LIDT: >10J/cm2@1064nm, 10ns, 10Hz
Dimensions, mm: Ø25.4 (+0/-0.1) x 6 (±0.1)
Clear Aperture: >90
Coatings:
Reflected wavefront distortion: < λ/8 (PV) @632.8nm

Protective chamfers: <0.25 mm x 45°
Thickness, mm: 6.35 (±0.1)

S2: AR (R<0.25%) @ 1320+1064 nm, AOI = 0°
S1: PR (R=75%±3%) @ 1320 nm + HT (R<1%) @ 1064 nm, AOI = 0°
S1/S2 Surface flatness, PV: <λ/8 @ 632.8 nm
Wedge / Parallelism error: 1° (±0.25°)
Material: UVFS
LIDT: >3 J/cm² @ 1320 nm, 10 ns
Diameter, mm: 25.4 (+0/-0.1)
Coatings:
Clear Aperture: >90
S1/S2 Surface quality, S-D: 10-5

S1/S2 Surface quality, S-D: 10-5
Wedge / Parallelism error: 1° (±0.25°)

Thickness, mm: 6.35 (±0.1)
S2: AR (R<0.25%) @ 1320+1064 nm, AOI=0°
S1: PR (R=60%±3%) @ 1320 nm + PR (R=20%±3%) @ 1064 nm, AOI = 0°
S1/S2 Surface flatness, PV: <λ/8 @ 632.8 nm
Protective chamfers: <0.25 mm x 45°
Material: UVFS
LIDT: >3 J/cm² @ 1320 nm, 10 ns
Diameter, mm: 25.4 (+0/-0.1)
Clear Aperture: >90
Coatings:

Surface quality S1/S2/S3: 20-10 before coating
Zone 1: IBS HRsp>99.9%@ 1061-1067 nm + Rsp>4%@ 630-636 nm AOI=0-2°

Zone 2: IBS PRsp=40+/-2%@ 1061-1067 nm + Rsp>4%@ 630-636 nm AOI=0-2°
Thickness, mm: 6.75
Shape: as per drawing
S4: 60-40 S-D
Beam deviation: <45 arcsec
Material: N-BK7 or equivalent
Dimentions: 33 x 22.3
Single pass WFD,RMS: L/10 @632.8nm over 6mm
Zone 3: IBS ARsp<0.1%@ 1061-1067 nm + Tsp>45%@ 630-636 nm AOI=0-5°

S2 Wedge, °: 1.5 @ 800 nm
Transmitted wavefront distortion, PV: <λ/4 @ 632.8 nm per Ø25.4 mm

Clear aperture %: >90
S2: Uncoated
S1: PR(R(s+p)/2=80% (+/-3%)) @ 800 nm AOI 45°
Protective chamfers: <0.25 mm x 45°
Material: UVFS (Corning 7980 0F)
LIDT: 100mJ/cm2 @ 800nm 50fs
Dimensions, mm: Ø50.8 (+0/-0.2)
Coatings:
Thickness (thin side), mm: 3 (±0.1)

S1: PR(R(s+p)/2=70% (+/-3%)) @ 800 nm AOI 45°
Thickness (thin side), mm: 3 (±0.1)

Transmitted wavefront distortion, PV: <λ/4 @ 632.8 nm per Ø25.4 mm
S2: Uncoated
S2 Wedge, °: 1.5 @ 800 nm
Material: UVFS (Corning 7980 0F)
LIDT: 100mJ/cm2 @ 800nm 50fs
Clear aperture %: >90
Dimensions, mm: Ø50.8 (+0/-0.2)
Coatings:
Protective chamfers: <0.25 mm x 45°

Protective chamfers: <0.25 mm x 45°
Clear aperture %: >90

Thickness (thin side), mm: 3 (±0.1)
S2: Uncoated
S1: PR(R(s+p)/2=60% (+/-3%)) @ 800 nm AOI 45°
Transmitted wavefront distortion, PV: <λ/4 @ 632.8 nm per Ø25.4 mm
Material: UVFS (Corning 7980 0F)
LIDT: 100mJ/cm2 @ 800nm 50fs
Dimensions, mm: Ø50.8 (+0/-0.2)
Coatings:
S2 Wedge, °: 1.5 @ 800 nm

S1: PR(R(s+p)/2=50% (+/-3%)) @ 800 nm AOI 45°
Transmitted wavefront distortion, PV: <λ/4 @ 632.8 nm per Ø25.4 mm

Thickness (thin side), mm: 3 (±0.1)
S2: Uncoated
S2 Wedge, °: 1.5 @ 800 nm
Protective chamfers: <0.25 mm x 45°
Material: UVFS (Corning 7980 0F)
LIDT: 100mJ/cm2 @ 800nm 50fs
Dimensions, mm: Ø50.8 (+0/-0.2)
Clear aperture %: >90
Coatings:

Thickness, mm: 8 (±0.1)
S2: AR (Rs<0.5% + R(s+p)/2<0.6%) @ 800 nm AOI 45°

S2 Flatness, PV: <λ/10 per inch @ 632.8 nm
Protective chamfers: <0.25 mm x 45°
S1 Flatness, PV: <λ/10 per inch @ 632.8 nm
Material: UVFS (Corning 7980 0F)
LIDT: 100mJ/cm2 @ 800nm 50fs
Dimensions, mm: Ø50.8 (+0/-0.2)
Coatings:
Clear aperture %: >90
S1: PR(R(s+p)/2=50% (+/-3%)) @ 800 nm AOI 45°
Parallelism error: <1 arcmin

S1: PR (Rs=50 ±3%) @ 343 nm
Surface quality, S-D: 20-10

S2: AR (Rs<0.5%) @ 343 nm
Material: UVFS
Dimensions, mm: Ø50.8 (+0/-0.1) x 6 (±0.1) (thinnest part)
Coatings:
Clear Aperture: >90
Wedge / Parallelism error: 1 degree ± 5 arcmin
Protective chamfers: 0.1-0.25 mm x 45°

Part Name: MP-25,4-FS-HR345 AR1040+520-45
Thickness, mm: 6.35 (±0.1)

S2: uncoated
S1: HR(Rs>99.9%) @ 342-347 nm, HT(Tp>99%) @ 512-522 nm + 1025-1045 nm (|GDDRs|<50 fs² @ 344 nm, E-Field optimized @ 344 nm ), AOI = 45°
Part Number: 12800
Material: UVFS (Corning 7980 0F)
Drawing Number: 12800_rev01
Diameter, mm: 25.4 (+0/-0.1)
Coatings: IBS (Al2O3/HfO2/SiO2)
Clear aperture: 85% central area
Remarks:

S1 (marked): HR (R>99%) @ 532 nm + HT (T>98.2%) @ 1064 nm, AOI 35-55°
Thickness, mm: 5.8 (±0.2)

Clear aperture: >Ø24 mm
Surface quality, S-D: 20-10
S2: AR (R<2%) @ 1064 nm, AOI 35-55°
Parallelism error: < 30 arcmin
Material: UV Fused Silica
Flatness RMS: ≤λ/4 @ 633 nm
Coatings:
Dimensions, mm: Ø25.2 (±0.2)
Protective chamfers: 0.25-0.5 mm

Protective chamfers: 0.1-0.25 mm x 45°
Coatings:

Dimensions, mm: Ø50.8 (+0/-0.1)
S1 Flatness, PV IR S2 Flatness, PV: <λ/8 @ 632.8nm per inch (<λ/2 after coatings)
Parallelism error: <1 arcmin
S1/S2 Surface quality, S-D: 20-10
S1: HR (Rs>99.8%) @ 515 nm + HT (Tp>98%) @ 1030 nm, AOI 45° IBS
S2: AR (Rp<0.2%) @ 1030 nm, AOI 45° EB
Thickness, mm: 6 (±0.1)
Clear Aperture: >90
Material: UVFS (Corning 7980 0F)

S1: HR (Rs>99%) @ 343 nm + HT (Tp>97%) @ 515 nm + 1030 nm, AOI 45° EB
S2: AR (Rp<1%) @ 515 nm + 1030 nm, AOI 45° EB

S1/S2 Surface quality, S-D: 20-10
Protective chamfers: 0.1-0.25 mm x 45°
Material: UVFS (Corning 7980 0F)
S1 Flatness, PV IR S2 Flatness, PV: <λ/8 @ 632.8nm per inch (<λ/8 after coatings)
Clear Aperture: >90
Dimensions, mm: Ø50.8 (+0/-0.1)
Coatings:
Parallelism error: <1 arcmin
Thickness, mm: 6 (±0.1)

S1 Flatness, PV IR S2 Flatness, PV: <λ/8 @ 632.8nm
Thickness, mm: 6 (±0.1)

Surface quality, S-D: 20-10
S2: AR(R<0.5%) @ 1064 + 1320-1340 nm, AOI = 0°
S1: HT(T>95%) @ 1064 nm + PR(R=80%±4%) @ 1320-1340 nm, AOI = 0°
Protective chamfers: <0.25 mm x 45°
Material: BK7
Dimensions, mm: Ø12.7 (+0/-0.1)
Coatings:
Clear Aperture: >84
Parallelism error: <1 arcmin

Material: UVFS (Corning 7980 0F)
Thickness, mm: 5 (±0.1)

Surface quality, S-D: 10-5 (after coatings 20-10)
S2: AR (R<1%) @ 1908 nm, AOI 0°
S1: PR (R=80±3%) @ 1908 nm, AOI 0°
Clear aperture %: >90
Parallelism error: <5 arcsec
S1 Flatness, PV IR S2 Flatness, PV: <λ/10 @ 632.8 nm (after coatings <λ/8- λ/10)
Dimensions, mm: Ø25.4 (+0/-0.1)
Coatings, EB:
Protective chamfers: <0.25 mm x 45°

Protective chamfers: <0.25 mm x 45°
Thickness, mm: 5 (±0.1)

Surface quality, S-D: 10-5 (after coatings 20-10)
S2: AR (R<0.5%) @ 1480-1550nm, AOI 0°
S1: PR (R=90%+/-3%) @ 1480-1550nm, AOI 0°
Material: UVFS (Corning 7980 0F)
S1 Flatness, PV IR S2 Flatness, PV: <λ/10 @ 632.8 nm (after coatings <λ/8- λ/10)
Dimensions, mm: Ø25.4 (+0/-0.1)
Clear aperture %: >90
Coatings, EB:
Parallelism error: <5 arcsec

Material: UVFS (Corning 7980 0F)
Surface quality, S-D: 10-5 (after coatings 20-10)

S2: AR (R(s+p)/2<0.65%) @ 1940nm, AOI 45°
S1: HR (R(s+p)/2>99.5%) @ 1480nm + HT (T(s+p)/2>95%) @1940 nm, AOI 45°
Clear aperture %: >90
Parallelism error: <5 arcsec
S1 Flatness, PV IR S2 Flatness, PV: <λ/10 @ 632.8 nm (after coatings <λ/8- λ/10)
Dimensions, mm: Ø25.4 (+0/-0.1)
Coatings, EB:
Thickness, mm: 5 (±0.1)
Protective chamfers: <0.25 mm x 45°

Material: UVFS (Corning 7980 0F)
Thickness, mm: 5 (±0.1)

Surface quality, S-D: 10-5 (after coatings 20-10)
S2: AR (R<0.5%) @ 793nm, AOI 0°
S1: HR (R>99.5%) @ 1480+1940 nm + HT (T>97%) @793 nm, AOI 0°
Parallelism error: <5 arcsec
S1 Flatness, PV IR S2 Flatness, PV: <λ/10 @ 632.8 nm (after coatings <λ/7- λ/8)
Dimensions, mm: Ø25.4 (+0/-0.1)
Coatings, EB:
Clear aperture %: >90
Protective chamfers: <0.25 mm x 45°

S1: PR (Rp=50 ±1%) @ 1023-1033 nm
Coatings:

Wedge / Parallelism error: <5 arcsec
Transmitted wavefront distortion, PV: < λ/8 (PV) @632.8nm
Surface quality, S-D: 20-10
S2: AR (R<0.65%) @ 1023-1033 nm
Protective chamfers: <0.25 mm x 45°
Material: UVFS Corning 7980 OF grade
Dimensions, mm: Ø30.0 (+0/-0.1) x 6 (±0.1)
Clear Aperture: >90
Reflected wavefront distortion: < λ/8 (PV) @632.8nm
LIDT: >10J/cm2@1064nm, 10ns, 10Hz

S1: HR>99.5% @ 532 nm + HT>92% @ 355 nm, AOI = 0-5°
Blanket order: RA

S2: AR<0.5% @ 355 nm, AOI = 0-5°
S1/S2 Surface quality, S-D: 40-20
S1/S2 Surface flatness: <λ/2 @ 632.8 nm
Protective chamfers: 0.1-0.3 mm x 45°
Paralellism error: <5 arcmin
Material: Corning 7980 0F
LIDT: >0.5 J/cm² @ 355 nm, 10 ns
Drawing ID: LP2016-D6_rev03
Dimensions, mm: Ø6 (+0/-0.1)
Coatings: e-beam
Clear Aperture: Ø5 central
Chips: <0.1 mm
Material: FS (Suprasil 2A)
Thickness, mm: 1 (±0.1)

S1 Flatness, PV IR S2 Flatness, PV: Thickness, mm: 6.0mm +/-0.25mm

Surface quality: 20-10 S-D
S2: AR (Rp<0.7%) @ 339-355 + 532 + 1064nm, AOI = 45deg
Material: UVFS
Diameter, mm: 50.8mm +0.0/-0.25mm
Coatings:
Clear Aperture: >90%
S1: HR (Rs>99%, Rp>98,5%) @ 266 + 283 nm + HT (Tp>90%) @ 339-355 nm + HT (Tp>95%) @ 532 + 1064 nm, AOI = 45deg

Material: UVFS
Wedge / Parallelism error: <1 arcmin

Transmission, nm: Ts>93% Tp>95% @ 800
Surface quality, S-D: 20-10
Protective chamfers: <0.25 mm x 45°
Dimensions, mm:   Ø50.8 (+0/-0.1) x 6 (±0.1)
Clear Aperture: >90
Angle of Incidence (AOI), °: 45
Reflection, nm: Rs>99.5% Rp>99.3% @ 400

Protective chamfers: <0.25 mm x 45°
Thickness, mm: 6 (±0.1)

S1: PR(Rsp=98.5%±0.5%) @ 1550 nm, AOI = 45°
S2: AR(Rsp<0.55%) @ 1550 nm, AOI = 45°
Material: UVFS (Corning 7980 0F)
Clear Aperture: >90
S1 Flatness, PV IR S2 Flatness, PV: <λ/4 @ 632.8nm
Dimensions, mm: Ø25.4 (+0/-0.1)
Coatings:
Surface quality, S-D: 40-20
Parallelism error: <1 arcmin

Surface quality, S-D: 20-10
Thickness, mm: 6 (±0.1)

S2: AR(Rsp<0.6%) @ 925 nm, AOI = 45°
S1: PR(Rsp=3%±0.6%) @ 925 nm, AOI = 45°
Protective chamfers: <0.25 mm x 45°
Material: UVFS (Corning 7980 0F)
S1 Flatness, PV IR S2 Flatness, PV: <λ/6 @ 632.8nm
Clear Aperture: >90
Dimensions, mm: Ø25.4 (+0/-0.1)
Coatings:
Parallelism error: <1 arcmin

S1/S2 Surface quality, S-D: 20-20 under concentrated light source
Transmitted wavefront distortion, PV: <λ/10 @ 633 nm

Thickness, mm: 6.35 (±0.2)
S2: AR (Rsp<0.7%) @ 755 nm, AOI = 45°
S2 LIDT:
S1: HR (Rs>99.5%, Rp>98.5%) @ 532+1064 nm +HT (Tsp>95%) @ 755 nm, AOI = 45°
Parallelism error: <3 arcmin
Protective chamfers: 0.25 (±0.05) mm x 45° (±5°)
Material: Corning 7980 0F
Dimensions, mm: Ø25.4 (+0/-0.2)
Coatings: e-beam
Clear Aperture: >90
S1 LIDT:
S1 Surface flatness: <λ/8 @ 633 nm after coating

Parallelism error: <1 arcmin
S2: AR(R<2%) @ 450-700 nm, AOI = 45°

S1: HR(Rs>99%, Rp>98%) @ 258+387 nm + HT (T>90%) @ 450-700 nm, AOI = 45°, GDDRsp = 0 ± 50 fs² @ 258+387 nm
S1 Surface quality, S-D: 20-10
Protective chamfers: <0.25 mm x 45°
Material: UVFS Corning 7980 0F
Dimensions, mm: Ø50.8 (+0/-0.1) x 6 (±0.1)
Coatings:
Clear Aperture: >90
S1 Flatness, PV: <λ/8 @ 632.8 nm

Irregularity, S1, PV: <λ/4 per CA @ 633 nm
Shape: Spherical plano concave

S2: uncoated
S2 Surface quality, S-D: 20-10
S1: HR (R>99.5%) @ 1908-1940 nm, AOI 0°
S1 Surface quality, S-D: 20-10
ROC S1, mm: -3000 (+/-3%)
Material: UVFS
Flatness, S2, PV: <λ/4 per CA @ 633 nm
Edge thickness, mm: 6.35 (+/-0.1)
Dimensions, mm: Ø25.4 (+0/-0.1)
Coatings, EB:
Clear aperture %: >90
Centration error: <3 arcmin
Center thickness, mm: (6.32)
Protective chamfers: <0.25 mm x 45°

Parallelism error between S1 and S2: < 30 arcsec
Thickness, mm: 6.35 mm (+/-0.1 mm)

Surface quality, S1/S2: 20-10 S-D
Surface flatness (PV), S1/S2: < L/10 @ 633 nm per clear aperture
S2: AR(Rs<0.85%, Rp<0.75%) @ 341-343 nm, AOI=45 deg + stress compensation, IBS
Protective chamfers: 0.1-0.25 mm x 45 deg
Clear aperture: >/=90 %
Material: Corning 7980 0F
Diameter, mm: 25.4 mm (+/-0.1 mm)
Coatings:
S1(^): Pol (Rs>99.7%, Tp>97%, GDDRs +/-300 fs^2, GDDTp +/-400 fs^2 @ 341-343 nm, AOI=45 deg (+/-2 deg for adjustment), IBS

Diameter, mm: 18 mm (+0/-0.1 mm)
S1: AR (R<0,2%) @ 532 nm + AR (R<10%) @ 635 nm, AOI 0°, IBS

Thickness, mm: 3 mm (+/-0.2 mm)
Surface quality, S1/S2: 20-10 S-D
Surface flatness (PV), S1/S2: < L/10 @ 633 nm per 10 mm diameter in clear aperture
S2: HR (R>99%) @ 685-715 nm + HT (T>90%) @ 532 nm + HT (T>90%) @ 635 nm + HT (T>92%) @ 745-1100 nm, AOI 0°, IBS
Protective chamfers: 0.1-0.3 mm x 45 deg
Material: FS (Corning 7980 0F)
Coatings:
Clear aperture: >/= 90 %, central area
Chips: < 0.3 mm
Parallelism error: < 1 arcmin

S1: AR (R<0,2%) @ 532 nm + AR (R<10%) @ 635 nm, AOI 0°, IBS
Surface quality, S1/S2: 20-10 S-D

Thickness, mm: 3 mm (+/-0.2 mm)
Surface flatness (PV), S1/S2: < L/10 @ 633 nm per 10 mm diameter in clear aperture
S2: HR (R>99%) @ 715-745 nm + HT (T>95%) @ 532 nm + HT (T>90%) @ 635 nm + HT (T>92%) @ 776-1100 nm, AOI 0°, IBS
Parallelism error: < 1 arcmin
Material: FS (Corning 7980 0F)
Diameter, mm: 18 mm (+0/-0.1 mm)
Coatings:
Clear aperture: >/= 90 %, central area
Chips: < 0.3 mm
Protective chamfers: 0.1-0.3 mm x 45 deg

Parallelism error: < 1 arcmin
Chips: < 0.3 mm

Surface quality, S1/S2: 20-10 S-D
Surface flatness (PV), S1/S2: < L/10 @ 633 nm per 10 mm diameter in clear aperture
S2: AR (R<0,5%) @ 635 + 685-715 nm, AOI 0°, IBS
Protective chamfers: 0.1-0.3 mm x 45 deg
Thickness, mm: 3 mm (+/-0.2 mm)
Material: FS (Corning 7980 0F)
Diameter, mm: 18 mm (+0/-0.1 mm)
Coatings:
Clear aperture: >/= 90 %, central area
S1: HR (R>99%) @ 532 nm + HT (T>90%) @ 635 nm + PR (R=50±3%) @ 685-715 nm, AOI 0°, IBS

S1: HR (R>99%) @ 532 nm + HT (T>90%) @ 635 nm + PR (R=70±3%) @ 685-715 nm, AOI 0°, IBS
Thickness, mm: 3 mm (+/-0.2 mm)

Surface quality, S1/S2: 20-10 S-D
Surface flatness (PV), S1/S2: < L/10 @ 633 nm per 10 mm diameter in clear aperture
S2: AR (R<0,5%) @ 635 + 685-715 nm, AOI 0°, IBS
Protective chamfers: 0.1-0.3 mm x 45 deg
Parallelism error: < 1 arcmin
Material: FS (Corning 7980 0F)
Diameter, mm: 18 mm (+0/-0.1 mm)
Coatings:
Chips: < 0.3 mm
Clear aperture: >/= 90 %, central area

S1: HR (R>99%) @ 532 nm + HT (T>90%) @ 635 nm + PR (R=50±2%) @ 715-745 nm, AOI 0°, IBS
Material: FS (Corning 7980 0F)

Thickness, mm: 3 mm (+/-0.2 mm)
Surface quality, S1/S2: 20-10 S-D
Surface flatness (PV), S1/S2: < L/10 @ 633 nm per 10 mm diameter in clear aperture
S2: AR (R<0,5%) @ 635 + 715-745 nm, AOI 0°, IBS
Parallelism error: < 1 arcmin
Chips: < 0.3 mm
Diameter, mm: 18 mm (+0/-0.1 mm)
Coatings:
Clear aperture: >/= 90 %, central area
Protective chamfers: 0.1-0.3 mm x 45 deg

Protective chamfers: 0.1-0.3 mm x 45 deg
Thickness, mm: 3 mm (+/-0.2 mm)

Surface quality, S1/S2: 20-10 S-D
Surface flatness (PV), S1/S2: < L/10 @ 633 nm per 10 mm diameter in clear aperture
S1: HR (R>99%) @ 532 nm + HT (T>90%) @ 635 nm + PR (R=70±2%) @ 715-745 nm, AOI 0°, IBS
Parallelism error: < 1 arcmin
Material: FS (Corning 7980 0F)
Diameter, mm: 18 mm (+0/-0.1 mm)
Coatings:
Clear aperture: >/= 90 %, central area
Chips: < 0.3 mm
S2: AR (R<0,5%) @ 635 + 715-745 nm, AOI 0°, IBS

S1/S2 Surface flatness: <λ/2 @ 633 nm
S1/S2 Surface flatness: <λ/2 @ 633 nm (after coating)

S1/S2 Surface quality, S-D: 40-20 (after coating)
S1: HRp>99.5% @ 1064 nm + HRs>90% @ 532 nm + HTp>92% @ 355 nm, AOI = 42-48 deg, e-beam IAD
S1: HRp>99.5% @ 1064 nm + HRs>90% @ 532 nm + HTp>92% @ 355 nm, AOI = 45 ± 3°
Thickness, mm: 1 (±0.1)
Clear Aperture: 5 x 5
Protective chamfers: 0.1-0.2 mm x 45°
S2: uncoated
Material: UVFS (Corning 7980 0F KrF grade)
Material: UVFS (C7980 0F KrF grade)
LIDT: >1 J/cm² @ 355 nm, 1 ns
Drawing: LP2030-3-6x6_Rev.00
Dimensions, mm: 6 x 6 (+0/-0.1)
Chips: <0.1 mm
Coatings: e-beam
Parallelism error: <1 arcmin
Coatings: e-beam IAD

Thickness, mm: 6 mm
Wedge / Parallelism error: <1 arcmin

Surface quality, S-D: : 60 - 40
Material: Fused silica
S1 Flatness, PV IR S2 Flatness, PV: <λ/4 @ 633nm
Diameter, mm: 76.2 mm
Coating: HR>98% @ 351nm + HT>95% @ 527 + 1053nm , AOI=45deg
Clear aperture: >90%
Protective chamfers: 0.1-0.3 mm x 45°
LIDT: >1.5J/cm^2 @ 351nm @ 1ns

S1: HR (Rs>99%, Rp>98.5%) @ 266 nm + HT (Ts>94%, Tp>98%) @ 532 nm, AOI 45°
Wedge / Parallelism error: <5 arcsec

Surface quality, S-D: 20-10
S2: AR (Rsp<0.65%) @ 532 nm, AOI 45°
Material: UVFS Corning 7980 OF grade
S1 Flatness, PV IR S2 Flatness, PV: <λ/10 @ 632.8 nm
Dimensions, mm: Ø25.4 (+0/-0.1) x 6.35 (±0.1)
Clear Aperture: >90
Coatings:
Protective chamfers: <0.25 mm x 45°

Protective chamfers: 0.1-0.3 mm x 45°
Wedge / Parallelism error: <1 arcmin

Thickness, mm: 6 (±0.1)
Surface quality, S-D: 60-40
S1 Flatness, PV IR S2 Flatness, PV: <λ/8 @ 632.8 nm per 1 inch
Clear Aperture: >90
Material: UVFS (Corning 7980 0F)
Dimensions, mm: Ø50.8 (+0/-0.1)
Coatings:
S2: AR (R<0.55%) @ 1550 nm, AOI=45°
S1: HR (R>99%) @ 532 nm, HT (T>90%) @ 1550 nm, AOI=45°

Wedge along 8 mm side: 1° (±0.016°)
S1/S2 Surface form error, fr: 3/ 0.4 (0.2)

S1/S2 Surface quality: 5/ 2 x 0.025
S1/S2 Test area, mm: Ø2 central CA
S1: PR(R=60±2%) @ 1029-1031 nm, AOI = 0°
S1: PR(R=60±2%) @ 1029-1031 nm, AOI = 0°, 25J/cm²; 1030 nm; 10 ns
S2: AR(R<0.2%) @ 1029-1031 nm, AOI = 0°
Thickness of thicker edge, mm: 3.1 (±0.1)
S1/S2 Surface form error, fr: 3/ 0.4 (0.2) (<λ/10 @ 633 nm)
Protective chamfers: 0.1-0.3 mm x 45°
S2: AR(R<0.2%) @ 1029-1031 nm, AOI = 0°, 10J/cm²; 1030 nm; 10 ns
Laser engraved, height of separated characters 2 mm: 600-1 (according to drawing)
Perpendicularity to A surface: 0.01 mm (according to drawing)
S1/S2 Surface quality: 5/ 2 x 0.025 (10-5 S-D under concentrated light source)
Dimensions, mm: 8 x 6 (±0.1)
Grinded 6 x 3 mm sides Surface roughness: Rq < 4 μm
Laser engraved, height of separated characters 2 mm: 600-1
Material: C7979
Parallelism to B surface: 0.02 mm
Coatings:
Parallelism to B surface: 0.02 mm (according to drawing)
Chips: <0.1 mm
Perpendicularity to A surface: 0.01 mm
Grinded 8 x 3 mm sides Surface roughness: 2 μm < Rq < 4 μm

Material: UVFS
Wedge / Parallel ism error: <1arcmin

Surface quality, S-D: 20-10
Surface flatness S2, PV: N/A
Surface flatness S1, PV: <λ/7 @ 632.8nm per CA
S2: AR (Rs<1.3%, Rp<1%) @ 285 nm, AOI 45°
Protective chamfers: 0.1-0.25 mm x 45°
Dimensions, mm: Ø38.1 (+0/-0.1) x 6 (±0.1)
Coatings:
Clear Aperture: >90
S1: HR (Rsp>99.5%) @ 400 nm + HT (Tsp>94%) @ 285 nm, AOI 45°

S1: HR (Rsp>99.5%) @ 400 nm + HT (Tsp>94%) @ 285 nm, AOI 45°
Wedge / Parallelism error: <5 arcsec

Surface quality, S-D: 20-10
S2: AR (Rs<1.3%, Rp<1%) @ 285 nm, AOI 45°
Material: UVFS Corning 7980 OF grade
Flatness S1, PV:   <λ/8 @ 632.8 nm
Dimensions, mm:   Ø25.4 (+0/-0.1) x 6 (±0.1)
Clear Aperture: >90
Coatings:
Protective chamfers: <0.25 mm x 45°

S2: uncoated
Thickness, mm: 6.35 mm (+/-0.1 mm)

Clear aperture: >90%
Surface quality, S1/S2: 10/5 S/D (After coating 20/10 S/D)
S1 Flatness, PV IR S2 Flatness, PV: <λ/10@633 nm (After coating <λ/8@633 nm)
Protective chamfers: <0.25 mm x 45°
Paralleslism error: <30 arcsec
Material: UVFS
Coatings: E-Beam
Diameter, mm: 25.4 mm (+0.0/-0.1 mm)
S1: HR(Rp>85.0%,Rs>95.0%)@195 - 205 nm, HT(Tp>95.0%)@266 nm + (Tp>95.0%)@400 nm + (Tp>95.0%)@800 nm , AOI=45°

Surface quality, S1/S2: 10/5 S/D (After coating 20/10 S/D)
Thickness, mm: 3.0 mm (+/-0.1 mm)

S1 Flatness, PV IR S2 Flatness, PV: <λ/10@633 nm (After coating <λ/8@633 nm)
S2: uncoated
S1: HR(Rp>85.0%,Rs>95.0%)@195 - 205 nm, HT(Tp>95.0%)@266 nm + (Tp>95.0%)@400 nm + (Tp>95.0%)@800 nm , AOI=45°
Paralleslism error: <30 arcsec
Material: UVFS
Diameter, mm: 25.4 mm (+0.0/-0.1 mm)
Coatings: E-Beam
Clear aperture: >90%
Protective chamfers: <0.25 mm x 45°