In stock
S2: AR(R<0.3%) @ 690 nm, AOI=0 deg
S1: AR(R<0.3%) @ 690 nm, AOI=0 deg
Transmitted wavefront distortion, PV:
S2: AR(R<0.3%) @ 690 nm, AOI=0 deg, with ion assistance
S1: AR(R<0.3%) @ 690 nm, AOI=0 deg, with ion assistance
All around surface: sanded matt
Parallelism error: < 2 arcmin
Chips: <0.2 mm
Material: H-K9L
Clear aperture: >/= 90 %, central area
Diameter, mm: 10 mm (+0/-0.09 mm)
Coatings:
Protective chamfers: 0.1-0.3 mm x 45 deg
Surface quality, S1/S2: 40-20 S-D
S1: AR(R<0.3%) @ 690 nm, AOI=0 deg
Transmitted wavefront distortion, PV:
S2: AR(R<0.3%) @ 690 nm, AOI=0 deg, with ion assistance
S1: AR(R<0.3%) @ 690 nm, AOI=0 deg, with ion assistance
All around surface: sanded matt
Parallelism error: < 2 arcmin
Chips: <0.2 mm
Material: H-K9L
Clear aperture: >/= 90 %, central area
Diameter, mm: 10 mm (+0/-0.09 mm)
Coatings:
Protective chamfers: 0.1-0.3 mm x 45 deg
Surface quality, S1/S2: 40-20 S-D
