In stock
S2 surface quality, S-D: 40 - 20 (after coating) [EXP]
Radius of curvature, R1: -137.5
Radius of curvature, R2: ∞
S1 Irregularity, PV: <λ/4 @ 632.8nm per Ø25.4mm within CA (after coating) [EXP]
S1 surface quality, S-D: 40 – 20 (after coating)
S1: AR (R < 0.2%) @ 532 + 1064 nm, AOI 0° (MS)
Clear aperture: >85% of “L” and “W” (centered, both directions)
Protective chamfers (S1/S2): 0.25 (±0.1) mm x 45°
S2: AR (R < 0.2%) @ 532 + 1064 nm, AOI 0° (MS)
Scatter, ppm: <150 @ 635 nm each side
S2 Irregularity, PV: <λ/4 @ 632.8nm per Ø25.4mm within CA (after coating) [EXP]
Material: UVFS Corning 7980 0F grade
LIDT: > 10 J/cm2 @ 532 and 1064 nm, 20 ns, <100 Hz, 200-on-1 per ISO-21254:2011
EFL, mm: -305.9 ± 1% @ 1064 nm
Edge thickness, mm: 12.7 (±0.1)
Edge finish: ground
Coatings:
Centration, S1/S2: < 15 arcmin
Center thickness, mm: 12.1 (±0.1)
Absorption, ppm: <50 @ 1064 nm each side
Notes:
Dimensions, mm: 76.2 (+0.0/-0.1) x 25.4 (+0.0/-0.1)
Radius of curvature, R1: -137.5
Radius of curvature, R2: ∞
S1 Irregularity, PV: <λ/4 @ 632.8nm per Ø25.4mm within CA (after coating) [EXP]
S1 surface quality, S-D: 40 – 20 (after coating)
S1: AR (R < 0.2%) @ 532 + 1064 nm, AOI 0° (MS)
Clear aperture: >85% of “L” and “W” (centered, both directions)
Protective chamfers (S1/S2): 0.25 (±0.1) mm x 45°
S2: AR (R < 0.2%) @ 532 + 1064 nm, AOI 0° (MS)
Scatter, ppm: <150 @ 635 nm each side
S2 Irregularity, PV: <λ/4 @ 632.8nm per Ø25.4mm within CA (after coating) [EXP]
Material: UVFS Corning 7980 0F grade
LIDT: > 10 J/cm2 @ 532 and 1064 nm, 20 ns, <100 Hz, 200-on-1 per ISO-21254:2011
EFL, mm: -305.9 ± 1% @ 1064 nm
Edge thickness, mm: 12.7 (±0.1)
Edge finish: ground
Coatings:
Centration, S1/S2: < 15 arcmin
Center thickness, mm: 12.1 (±0.1)
Absorption, ppm: <50 @ 1064 nm each side
Notes:
Dimensions, mm: 76.2 (+0.0/-0.1) x 25.4 (+0.0/-0.1)
