In stock
S1 Flatness, PV: <λ/10 @ 632.8 nm
S1: AR (R<0.1%) @ 532 nm; AOI 0°
Thickness, mm: 5 (+/-0.1)
S2: AR (R<0.1%) @ 532 nm; AOI 0°
S2 Flatness, PV: <λ/10 @ 632.8 nm
S1 Surface quality, S-D: 20-10
Parallelism, arcesc: <5
Material: UVFS (7980 OF)
LIDT: > 20 J/cm2 @ 10 Hz 10 ns 10 mm (1/e2) 532 nm
Dimensions, mm: Ø25.4 (+0/-0.1)
Coatings Ion Beam Sputtering):
Clear aperture %: >90
S2 Surface quality, S-D: 20-10
Protective chamfers: <0.25 mm x 45°
S1: AR (R<0.1%) @ 532 nm; AOI 0°
Thickness, mm: 5 (+/-0.1)
S2: AR (R<0.1%) @ 532 nm; AOI 0°
S2 Flatness, PV: <λ/10 @ 632.8 nm
S1 Surface quality, S-D: 20-10
Parallelism, arcesc: <5
Material: UVFS (7980 OF)
LIDT: > 20 J/cm2 @ 10 Hz 10 ns 10 mm (1/e2) 532 nm
Dimensions, mm: Ø25.4 (+0/-0.1)
Coatings Ion Beam Sputtering):
Clear aperture %: >90
S2 Surface quality, S-D: 20-10
Protective chamfers: <0.25 mm x 45°
