In stock
Dimensions, mm: Ø25.4 (+0/-0.1) x 5 ( ±0.1)
Wedge / Parallelism error: <1 arcmin
Surface quality, S-D: 20-10
S2: Stress compensating SiO2 layer
S1: HRu>99.9%@ 515-532 nm + 1030-1064 nm, AOI=45 deg, low phase shift optimized
Protective chamfers: 0.1-0.3 mm x 45°
S1 Flatness, PV IR S2 Flatness, PV: <λ/8 @ 632.8 nm
Clear Aperture: >90
Material: UVFS
Wedge / Parallelism error: <1 arcmin
Surface quality, S-D: 20-10
S2: Stress compensating SiO2 layer
S1: HRu>99.9%@ 515-532 nm + 1030-1064 nm, AOI=45 deg, low phase shift optimized
Protective chamfers: 0.1-0.3 mm x 45°
S1 Flatness, PV IR S2 Flatness, PV: <λ/8 @ 632.8 nm
Clear Aperture: >90
Material: UVFS
