In stock
Reflection p-pol: <3%
Wedge / Parallelism error: 1° (±5 arcmin)
Wavelength, nm: 1213-1327 (centered @ 1270 nm)
Configuration: Max R contrast
Transmitted wavefront distortion, PV: <λ/6 @ 632.8 nm
Surface quality, S-D: 20-10
Reflection s-pol, %: >84%
Protective chamfers: <0.25 mm x 45°
Material: UVFS
Extinction Ratio: >30:1
Dimensions, mm: 20 (+0/-0.1) x 60 (+0/-0.1) x 5 (±0.1)
Clear Aperture: >90
Angle of Incidence (AOI), °: 72
S1 Flatness, PV IR S2 Flatness, PV: <λ/5 @ 632.8 nm
Wedge / Parallelism error: 1° (±5 arcmin)
Wavelength, nm: 1213-1327 (centered @ 1270 nm)
Configuration: Max R contrast
Transmitted wavefront distortion, PV: <λ/6 @ 632.8 nm
Surface quality, S-D: 20-10
Reflection s-pol, %: >84%
Protective chamfers: <0.25 mm x 45°
Material: UVFS
Extinction Ratio: >30:1
Dimensions, mm: 20 (+0/-0.1) x 60 (+0/-0.1) x 5 (±0.1)
Clear Aperture: >90
Angle of Incidence (AOI), °: 72
S1 Flatness, PV IR S2 Flatness, PV: <λ/5 @ 632.8 nm
