9666786

LIDT: >10J/cm² for 10 ns pulses, 532 nm
Wedge / Parallelism error: <1 arcmin
Thickness, mm: 9.5 (±0.1)
Surface quality, S-D: 20-10
S2: AR(R<0.5%)@355nm
S1: HR(R>99.5%)@ 1064 + 532nm + HT(T>95%)@355nm
Protective chamfers: 0.1-0.25 mm x 45°
LIDT: >20J/cm² for 10 ns pulses, 1064 nm
S1 Flatness, PV IR S2 Flatness, PV: <λ/8 @ 632.8 nm
Dimensions, mm: Ø19.05 (+0/-0.1)
Coating:
Clear aperture: >90%
Angle of Incidence (AOI), °: 0
Material: UVFS