In stock
Protective chamfers: 0.1-0.3 mm x 45 deg
Thickness, mm: 3 mm (+/-0.1 mm)
Surface quality, S1/S2: 20-10 S-D
S1: AR(Rsp<0.7%)@ 1064 nm +/-10 nm, AOI=45 deg, e-beam
Transmitted wavefront distortion, PV: Parallelism error: <1 arcmin
Material: UVFS
Difference between s and p polarizations: <0.1 %
Diameter, mm: 25.4 mm (+0/-0.1 mm)
Coatings:
Clear aperture: >90 %
S2: AR(Rsp<0.7%)@ 1064 nm +/-10 nm, AOI=45 deg, e-beam
Thickness, mm: 3 mm (+/-0.1 mm)
Surface quality, S1/S2: 20-10 S-D
S1: AR(Rsp<0.7%)@ 1064 nm +/-10 nm, AOI=45 deg, e-beam
Transmitted wavefront distortion, PV:
Material: UVFS
Difference between s and p polarizations: <0.1 %
Diameter, mm: 25.4 mm (+0/-0.1 mm)
Coatings:
Clear aperture: >90 %
S2: AR(Rsp<0.7%)@ 1064 nm +/-10 nm, AOI=45 deg, e-beam