In stock
Protective chamfers: 0.2-0.3 mm x 45°
S2: uncoated
S2 Surface quality, S-D: Fine grind
S1: HR(Rs>99%) @ 266 nm, HT(Tp>95%) @ 532+1064 nm, AOI=45°
S1 Flatness, PV: <λ/10 @ 632.8 nm
Parallelism error: <5 arcmin
Material: UVFS
LIDT: >15 J/cm², 1064 nm, 10 ns, <50 Hz (p pol), >2 J/cm² for 266 nm, 8 ns, <50 Hz (s-pol)
Dimensions, mm: Ø12.7 (+0/-0.1) x 3 (±0.1)
Coatings:
Clear Aperture: 85 (central area)
S1 Surface quality, S-D: 10-5
S2: uncoated
S2 Surface quality, S-D: Fine grind
S1: HR(Rs>99%) @ 266 nm, HT(Tp>95%) @ 532+1064 nm, AOI=45°
S1 Flatness, PV: <λ/10 @ 632.8 nm
Parallelism error: <5 arcmin
Material: UVFS
LIDT: >15 J/cm², 1064 nm, 10 ns, <50 Hz (p pol), >2 J/cm² for 266 nm, 8 ns, <50 Hz (s-pol)
Dimensions, mm: Ø12.7 (+0/-0.1) x 3 (±0.1)
Coatings:
Clear Aperture: 85 (central area)
S1 Surface quality, S-D: 10-5
